- Thermally robust: triarylsulfonium ionic liquids stable in air for 90 days at 300 °C
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Select triarylsulfonium salts constitute ionic liquids with outstanding long-term, high-temperature aerobic stability (no mass loss in 90 days at 300 °C in air), making them among the most thermally stable organic materials known. A detailed analysis of their thermophysical properties reveals that lowering melting points in these salts by increasing ion size or lowering ion symmetry cannot be assumed, but remains an iterative process.
- Siu, Benjamin,Cassity, Cody G.,Benchea, Adela,Hamby, Taylor,Hendrich, Jeffrey,Strickland, Katie J.,Wierzbicki, Andrzej,Sykora, Richard E.,Salter, E. Alan,O'Brien, Richard A.,West, Kevin N.,Davis, James H.
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- CURABLE COMPOSITION AND CURED ARTICLE USING SAME
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The heat- or energy ray-curable composition for members contains an onium gallate salt having a specific structure. The invention is a heat- or energy ray-curable composition comprising a cationic polymerizable compound and an acid generator containing an
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Paragraph 0197
(2018/12/02)
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- ONIUM BORATE SALT, ACID GENERATOR, CURABLE RESIN COMPOSITION AND CURED BODY PREPARED THEREWITH
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PROBLEM TO BE SOLVED: To provide an onium borate salt and the like having cationic polymerizing performance and crosslinking reacting performance. SOLUTION: An onium borate salt contains onium borate salt (OB1) represented by general formula (1) and onium borate salt (OB2) represented by general formula (2), where the content of (OB2) in (OB1) and (OB2) is 0.01-4 wt.% [(R1)n+1-E]+ [(R2)bB(Ar)4-b]- (1), [(R1)n+1-E]+ [(OH)(R2)bB(Ar)3-b]- (2) [in formulae (1) and (2), E represents an n-valence element of Group VIA to Group VIIA (CAS notation) and n is an integer of 1 or 2; R1 is an organic group bonded to E; R2 is an organic group bonded to B (boron) and b is an integer of 1 to 3; and Ar represents a substituted phenyl group and b is an integer of 1 to 3]. SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT
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Paragraph 0125
(2018/06/12)
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- PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
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Provided is a non-ionic photoacid generator (A) expressed by general formula (1). R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group
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Paragraph 0193; 0194
(2017/07/31)
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- PHOTOACID GENERATOR AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
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PROBLEM TO BE SOLVED: To provide a nonionic photoacid generator having high photosensitivity to i-line, excellent heat-resistant stability, high compatibility with a hydrophobic material, and excellent solubility in a resist solvent. SOLUTION: A nonionic photoacid generator (A) represented by formula (1) below is provided. In the formula (1), R1 and R2 represent a hydrocarbon group having 1 to 18 carbon atoms, which may have a substituent (where a part of or all of hydrogen atoms may be replaced by fluorine atoms), and R1 and R2 may be identical or different from each other; and Y is a group represented by formula (2). COPYRIGHT: (C)2015,JPO&INPIT
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Paragraph 0145-0147
(2018/01/11)
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- HYBRID ONIUM SALT
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The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provi
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- Novel anthracene derivative and radiation-sensitive resin composition
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A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.
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- Sulfonium salt and its manufacturing method
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This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound
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- Sulfonium salt and its manufacturing method
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This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound
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