- Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
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The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
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Page/Page column 9
(2008/06/13)
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- Oxidative Additionen an 2-Amino-4,4,5,5-tetrakis(trifluormethyl)-1,3,2-dioxaphospholan
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Oxidative addition of HF, Cl2, and (CF3)2CO to the title compound 6 furnishes the phosphoranes 2, 9, and 3, respectively.In the case of NH4 (4) the hydrospirophosphorane 1 is obtained via a substitution reaction followed by an oxidative addition.Compound 9 is a precursor for the aminotetraalkoxyphosphoranes 5, 8, and the very stable phosphazene 10 which is formed by loss of HCl by thermolysis.Due to a slow ligand exchange the 19F NMR spectrum of phosphorane 3 exhibits eight magnetically non equivalent CF3 groups.By means of 19F homodecoupling experiments extensive through space coupling is found in the molecule.The x-ray structure analysis of 3 shows a slight distortion from the trigonal bipyramidal geometry at phosphorus.For comparison, F2PNH2 and tBu2PNH2 react with (CF3)2CO to form (CF3)2C=NH, the aminofluorophosphorane 11, F2P(=O)OCH(CF3)2 (13), tBu2P(=O)H (12) and tBu2P(=O)OCH(CF3)2 (14), respectively.
- Storzer, Werner,Roeschenthaler, Gerd-Volker,Schmutzler, Reinhard,Sheldrick, William S.
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p. 3609 - 3624
(2007/10/02)
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- Stable fluorinated sulfuranes and sulfurane oxides. Synthesis and reactions
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Bis(trifluoromethyl) sulfide, tetrafluoro-1,3-dithietane, and bis(trifluoromethyl) sulfoxide undergo oxidative addition when photolyzed with trifluoromethyl hypochlorite to form a new family of sulfuranes, bis(trifluoromethyl)bis(trifluoromethoxy)sulfurane (1) and tetrafluoro-1,3-tetrakis(trifluoromethoxy)dithietane (3), and of sulfurane oxides, bis(trifluoromethyl)bis(trifluoromethoxy)sulfurane oxide (2). Compounds 1 and 2 are hydrolyzed to bis(trifluoromethyl) sulfoxide and bis(trifluoromethyl) sulfone, respectively. Pyrolysis of 1, 2, or 3 gives bis(trifluoromethyl) sulfide, bis(trifluoromethyl) sulfoxide, and tetrafluoro-1,3-dithietane, respectively, plus bis(trifluoromethyl) peroxide. With primary amines, 1 and 2 yield N-alkylbis(trifluoromethyl)sulfimides and sulfoxyimides, and with N,N′-diethylaminotrimethylsilane, imine formation occurs. Sulfurane oxide 2 forms a new type of stable sulfurane oxide (4), bis(trifluoromethyl)bis(hexafluoroisopropylidenimido)sulfurane oxide, with lithium hexafluoroisopropylidenimine. Sulfurane 1 acts in a similar manner with the nucleophile but the sulfurane 5 is not isolated. Compounds 1 and 2 form α,α,α-(trifluoromethyl)anisole derivatives with substituted phenols. Secondary and tertiary alcohols are dehydrated by 1 or 2 to olefins but symmetrical alkyl ethers result when primary alcohols are reacted.
- Kitazume, Tomoya,Shreeve, Jean'ne M.
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p. 2173 - 2176
(2007/10/10)
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