THE SILICON-OXYGEN DOUBLE-BONDED INTERMEDIATES. A NEW METHOD FOR THE FORMATION OF ORGANOSILANONES
The kinetics and mechanism of thermal decomposition of R1R2(H)SiOOR3 silylperoxides have been studied.It has been shown that peroxides generated diorganosilanones, R1R2Si=O, with a high yield in the temperature range 130-180 deg C.A mechanism is suggested for the silanone formation.The interaction of silanones with cyclosiloxanes, triethylsilane, α-methylstyrene has been investigated as well as the cyclisation of silanones.
Tomadze, A. V.,Yablokova, N. V.,Yablokov, V. A.,Razuvaev, G. A.
p. 43 - 50
(2007/10/02)
More Articles about downstream products of 17082-41-6