- Photochemistry of 3-methyl- and 4-methyl-1,2-dihydronaphthalene in solution
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Photolysis of 3-methyl-1,2-dihydronaphthalene (3-MDHN) in hexane solution with 254-nm light produces one major product, 5-methylbenzobicyclo[3.1.0]hex-2-ene(5-MBBH; φ = 4.7 × 10-4). Photolysis in hexane in the presence of trifluoroacetic acid produces exclusively 2-methylene-1,2,3,4-tetrahydronaphthalene (2-MTHN). The 254-nm photolysis of 4-methyl-1,2-dihydronaphthalene (4-MDHN) in hexane produces 2-(o-tolyl)-1,3-butadiene (T13B; φ= 2.2 × 10-3), 1-methylbenzobicyclo[3.1.0]hex-2-ene (1-MBBH; φ= 1.4 × 10-3), 1 -methyl- 1,4-dihydronaphthalene (1-M-1,4-DHN; φ= 8.7 × 10-3), 1-methyltetralin (1-MT; φ= 1.5 × 10-3), and 1-methylnaphthalene (1-MN; φ= 2.7 × 10-3). Triplet sensitization of 4-MDHN produces only 1-MN in small amounts, suggesting that the direct photolyses proceed via singlet chemistry. The products appear to derive from a combination of electrocyclic opening of the cyclohexadienyl ring to generate an o-quinodimethane intermediate, disproportionation leading to net oxidation-reduction and, in 4-MDHN, a [1,3] hydrogen shift to form 1-M-1,4-DHN. The o-quinodimethane intermediates further react to form benzobicyclo[3.1.0]hex-2-ene derivatives (via a photochemical [4 + 2] cycloaddition; Scheme VI) and, in the case of 4-MDHN, the 1,3-butadiene T13B (via a thermal [1,5] hydrogen shift; Scheme VII).
- Duguid, Robert J.,Morrison, Harry
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p. 1265 - 1271
(2007/10/02)
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- Photochemistry of 3-methyl- and 4-methyl-1,2-dihydronaphthalene in the gas phase1
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The photochemistry of 3-methyl-1,2-dihydronaphthalene (3-MDHN) and 4-methyl-1,2-dihydronaphthalene (4-MDHN) has been studied in the gas phase. Photolysis of 3-MDHN with 254-nm light produces 2-methyl-1,2-dihydronaphthalene (2-MDHN) as the major primary product. Naphthalene is also formed, apparently as a secondary photoproduct from 2-MDHN. Addition of butane to the photolysis mixture quenches the formation of 2-MDHN while producing a new photoproduct, 1-isopropenylbenzocyclobutene (IBCB). This product is also formed when light centered at 300 nm is used for the photolysis. Photolysis of 4-MDHN vapor with 254-nm light gives three products unique to the gas phase: 1-isopropenyl-2-vinylbenzene (IVB), 3-(o-tolyl)-1,2-butadiene (T12B), and 1-methyl-1,2-dihydronaphthalene (1-MDHN). An apparent alkyl shift product, 3-methyl-1,2-dihydronaphthalene (3-MDHN), and naphthalene are also formed, apparently as secondary photolysis products from 1-MDHN. In addition, several photoproducts common to both the solution and gas phase are detected: 2-(o-tolyl)-1,3-butadiene (T13B), 1-methylbenzobicyclo[3.1.0]hex-2-ene (1-MBBH), 1-methyl-1,4-dihydronaphthalene (1-M-1,4-DHN), 1-methyltetralin (1-MT), and 1-methylnaphthalene (1-MN). Again, the presence of butane during the 254-nm photolysis, or the use of longer wavelength light, gives rise to a new photoproduct, 1-methyl-1-vinylbenzocyclobutene (MVBCB). The fluorescence excitation spectrum for 4-MDHN confirms that 254-nm excitation into S2 leads to minimal population of the emissive vibrational levels of S1. Two pathways appear to dominate the photochemistry: retro [4 + 2] cycloaddition to give o-quinodimethane intermediates and sequential hydrogen shifts. These pathways derive from S2 and/or upper vibrational levels of S1 (S1vib) as indicated by the characteristic responses of their ultimate products to the presence of buffer gas. The benzocyclobutenes are unique; they are postulated to arise through a 2 + 2 closure of a vibrationally relaxed precursor o-quinodimethane or via a [1,3] sigmatropic shift in a uniquely populated set of S1vib levels.
- Duguid, Robert J.,Morrison, Harry
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p. 1271 - 1281
(2007/10/02)
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- The photochemical rearrangement of 1,2-dihydronaphthalenes into 1,4-dihydronaphthalenes induced by amines
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The synthetic usefulness of the deprotonation/protonation reaction of excited 1,2-dihydronaphthalenes into 1,4-dihydronaphthalenes induced by amines has been investigated using 13 different substituted 1,2-dihydronaphthalenes and related compounds.The yield of the rearrangement ranges from 5 to 96percent.The formation of side-products depends on the position of protons in the substrate, which can be abstracted by the amine, and on competitive photoreactions.
- Cuppen, Th. J. H. M.,Berendsen, N.,Laarhoven, W. H.
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p. 168 - 171
(2007/10/02)
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- SILICON-MODIFIED BIRCH REDUCTION AND REDUCTIVE ALKYLATION OF POLYNUCLEAR AROMATICS
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A trimethylsilyl substituent is used to control regiochemistry, overreduction, and prevent bond cleavage during the metal/ammonia reduction of aromatic and polynuclear aromatic compounds.The trimethylsilyl group is then removed by tetrabutylammonium fluoride and replaced by either hydrogen or primary alkyl, the latter case representing overall reductive alkylation.Results are presented for naphtalene together with its 1-methyl, 2-methyl and 2-methoxy derivatives, phenanthrene and its 9-methyl and 9-ethyl derivatives, biphenyl and triptycene.
- Marcinow, Z.,Clawson, D. K.,Rabideau, P. W.
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p. 5441 - 5448
(2007/10/02)
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