The invention relates to polyedric oligomeric silicon/oxygen clusters characterised by a structure of formula: [(RaXbArSiO1,5)m (RcXdAsSiO)n (ReXfAtSi2O2,5)o (RgXhAuSi2O2)p] where a, b, c and r = 0-1, d and s = 0-2, e, g, f, and t = 0-3, h and u = 0-4, m+n+o+p = 4-14, a+b+r = 1, c+d+s = 2, e+f+t = 3, g+h+u = 4, r+s+t+u = 1, R = H, alkyl, cycloalkyl, alkinyl, cycloalkinyl, aryl, heteroaryl, or a polymeric group, which is substituted or unsubstituted, an alkenyl or cycloalkenyl group with no hydrogen atoms directly on the double bond, or further functionalised polyedric, oligomeric silicon/oxygen cluster units bonded by means of a polymeric unit or a bridging unit, X = oxy, hydroxy, alkoxy, carboxy, silyl, alkylsilyl, alkoxysilyl, siloxy, alkylsiloxy, alkoxysiloxy, silylalkyl, alkoxysilylalkyl, alkylsilylalkyl, halogen, epoxy, ester, fluoroalkyl, isocyanate, protected isocyanate, acrylate, methacrylate, mercapto, nitrile, amino, phosphine group or at least one such group from the substituents of type R comprising type X, A = a substituent with at least one aldehyde group, whereby substituents of type R, type A and also type X are the same or different and comprising at least one substituent, preferably of type A and method for production thereof.