- PH-sensitive poly(histidine methacrylamide)
-
This research reports a synthetic amino acid based zwitterionic poly(histidine methacrylamide) (PHisMA), which possesses switchability among zwitterionic, anionic, and cationic states, pH-dependent antifouling properties, and chelation capability to multivalent metal ions. The PHisMA polymer brush surface shows good antifouling properties to resist protein adsorption and bacterial attachment in its zwitterionic state at pH 5. This study also demonstrates that the solution acidity significantly affects the mechanical properties of PHisMA hydrogels. PHisMA hydrogels show higher viscoelastic properties and lower swelling ratios in the zwitterionic state at pH 4 and pH 5, compared to higher or lower pH conditions. It was discovered that PHisMA can chelate multivalent metal ions, such as Ca2+, Mg2+, Cu2+, Ni2+ and Fe3+. This study provides us a better understanding of structure-property relationships of switchable zwitterionic polymers. PHisMA can potentially be adapted for a broad range of applications including wound care, water treatment, bioseparation, coating, drug and gene delivery carriers, etc.
- Wang, Huifeng,Wu, Haiyan,Lee, Chen-Jung,Lei, Xia,Zhe, Jiang,Xu, Fujian,Cheng, Fang,Cheng, Gang
-
p. 6544 - 6550
(2016/07/07)
-
- PROCESS FOR PRODUCING ORGANOALKOXYSILANES FROM ORGANIC ACIDS OR CYANATES AND HALOALKYLALKOXYSILANES
-
A process for the preparation of organoalkoxysilanes containing one or more organic functional groups derived from organic acids or hydrogen cyanates, by a continuous or batch process utilizing a solid guanidinium salt as a phase transfer catalyst for the reaction between a liquid phase haloalkylalkoxysilane and a solid phase alkali or alkaline earth metal salt or ammonium salt of an organic acid or a metal cyanate.
- -
-
Page/Page column 4
(2010/11/25)
-
- Acrylate ester
-
The present invention concerns a method for the production of olefin anhydrides, such as acrylic anhydride and methacrylic anhydride, via reactions between an aromatic acid chloride, such as benzoyl chloride, and carboxylate ions of the olefin acid corresponding to the anhydride to be produced. The method of the invention may be conducted without the use of a solvent, catalyst, polymerization inhibitor, or an external source of heat. Moreover the acrylic anhydrides of the invention can be used to produce high yields of acrylate esters by means of room-temperature reactions, without mineral acid catalysis.
- -
-
-
- Method for producing glycidyl methacrylate
-
Glycidyl methacrylate is produced by the reaction of an alkali metal salt of methacrylic acid with epichlorohydrin in the presence of a quaternary ammonium salt and a polymerization inhibitor in a reaction system where the water content is adjusted to 500 to 2000 ppm. Glycidyl methacrylate is purified by the method of the present invention, wherein the reaction mixture obtained by the above method is washed with a dilute aqueous solution of sodium hydroxide and heated under a reduced pressure to remove unchanged epichlorohydrin by distillation, after which steam is blown into the reaction system under the conditions of reduced pressure and heating to distill away the remaining epichlorohydrin together with glycidyl methacrylate as the first distillate fraction, followed by ceasing the steam blow and carrying out distillation under the conditions of reduced pressure and heating to obtain glycidyl methacrylate as the main distillate fraction.
- -
-
-
- Method for purification of glycidyl acrylate or glycidyl methacrylate
-
This invention relates to a method for the purification of glycidyl acrylate or glycidyl methacrylate. Specifically, the invention effects the purification by using a residual catalyst-inactivating additive and consequently produces highly purified glycidyl acrylate or glycidyl methacrylate containing substantially no epichlorohydrin and having a low chlorine content.
- -
-
-
- Monomeric compounds
-
Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: EQU1 R1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R2 is a substituted or unsubstituted aryl group or heterocyclic group having aromatic character. R3, R4, and R5 are hydrogen, halogen or lower alkyl. R6 and R7 may be hydrogen, halogen, nitro, lower alkyl, phenyl, substituted phenyl, phenoxy and lower alkoxy. Lithographic plates bearing these photosensitive polymers can be stored without deterioration for extended periods prior to exposure, and produce highly abrasion resistant plates on being exposed. The photosensitive polymers of the invention are preferably produced by homopolymerization of novel monomers having the general formula EQU2 where R1 ' is alkylene, haloalkylene, alkoxyalkylene, aminoalkylene, cycloalkylene, aralkylene, cycloalkylalkylene, cyanoalkylene, and aryloxyalkylene, and R2, R3, R4, R5, R6, and R7 are as defined above; and by copolymerization of these monomers with one or more ethylenically unsaturated comonomers. Methods of preparing the photopolymers and the novel monomers are also disclosed, as are methods of preparing and exposing plates bearing the polymers.
- -
-
-