BASE CLEAVAGE OF THE BENZYL-SILICON BOND IN PhCH2SiMe2(CH2)nOH (n = 2 or 3) COMPOUNDS
The compounds PhCH2SiMe2(CH2)nOH with n = 2 or 3 are cleaved 0.75 and 95-135 times, respectively, as readily as PhCH2SiMe3 by NaOMe/MeOH at 50 deg C.The high reactivity of the compound with n = 3 may arise from intramolecular attack of the alkoxide centre
Eaborn, Colin,Mahmoud, Foad M.S.
p. 13 - 16
(2007/10/02)
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