Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information and book reviews.
All papers are peer-reviewed in the usual Advanced Materials quality.
Chemists, physicists and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films and ceramic processing now have a unified forum for their work.
Readers
Materials scientists, chemists, physicists
Online ISSN: 1521-3862
Print ISSN: 0948-1907
Editors:
Michael L. Hitchman
Peter Gregory
Editorial Office:
Chemical Vapor Deposition
Department of Pure and Applied Chemistry
University of Strathclyde
295 Cathedral Street
Glasgow G1 1XL, UK
Phone: (+44) 141 553 4189
Fax: (+44) 141 548 4822
E-mail: m.l.hitchman@strath.ac.uk |
