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Keywords: Direct Process · Direct Process residue · disilane
cleavage · HCl in Et2O · siloxanes
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equilibrium mixture especially at elevated temperatures. Already at rt
Me2Si(OEt)2 gives Me2SiCl(OEt) and Me2SiCl2 (60/40%) upon reaction
with HCl/Et2O. (EtO)Me2SiÀSiMe2(OEt) yields the chlorinated disilane 3
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Received: August 11, 2016
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