Photochemically-Removable Silyl Protecting Groups

DOI: 10.1021/jo00077a010

Source and publish data:

Journal of Organic Chemistry p. 6961 - 6963 (1993)

Update date:2022-08-03

Topics:

Authors:

Pirrung, Michael C.

Lee, Yong Rok

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Article abstract of DOI:10.1021/jo00077a010

(Hydroxystyryl)dimethylsilyl (HSDMS) and (hydroxystyryldiisopropylsilyl (HSDIS) reagents have been developed that readily protect primary and secondary alcohols and can be removed on irradiation with short wavelength light in polar solvent.

Full text of DOI:10.1021/jo00077a010

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Article Doi

Photochemically-Removable Silyl Protecting Groups

DOI: 10.1021/jo00077a010

Source and publish data:

Authors:

Article abstract of DOI:10.1021/jo00077a010

Full text of DOI:10.1021/jo00077a010

Products guided by the article

R&D Labs maybe for 62037-32-5

Relevant to this article

7-Alkoxy-4-phenylamino-3-quinolinecarbonitriles as Dual Inhibitors of Src and Abl Kinases

Ternary copper complexes for photocleavage of DNA by red light: Direct evidence for sulfur-to-copper charge transfer and d-d band involvement

Total Synthesis and Absolute Configuration of 7,20-Diisocyanoadociane

Synthesis of new N-analogous corollosporine derivatives with antibacterial activity by laccase-catalyzed amination

Discovery of practical production processes for arylsulfur pentafluorides and their higher homologues, bis- and tris(sulfur pentafluorides): Beginning of a new era of "super-trifluoromethyl" arene chemistry and its industry