1600 cd m22 at 11.5 V. The maximum efficiencies were 0.20%
of external quantum efficiency, 0.06 lm W21 of power effi-
ciency, and 0.19 cd A21 of luminance efficiency at 10 V with
1156 cd m22 luminance.
15 M. Grell, D. D. C. Bradley, G. Ungar, J. Hill and K. S. Whitehead,
Macromolecules, 1999, 32, 5810.
16 K.-H. Weinfurtner, H. Fujikawa, S. Tokito and Y. Taga, Appl.
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17 W.-L. Yu, J. Pei, W. Huang and A. J. Heeger, Adv. Mater., 2000,
12, 828.
18 G. Kla¨rner, J.-I. Lee, M. H. Davey and R. D. Miller, Adv. Mater.,
1999, 11, 115.
Conclusion
19 J.-I. Lee, G. Klaerner and R. D. Miller, Chem. Mater., 1999, 11,
1083.
20 C. Xia and R. C. Advincula, Macromolecules, 2001, 34, 5854.
21 S. Setayesh, A. C. Grimsdale, T. Weil, V. Enkelmann, K. Mu¨llen,
F. Meghdadi, E. J. W. List and G. Leising, J. Am. Chem. Soc.,
2001, 123, 946.
22 X. Gong, P. K. Iyer, D. Moses, G. C. Bazan, A. J. Heeger and
S. S. Xiao, Adv. Funct. Mater., 2003, 13, 325.
23 U. Scherf and E. J. W. List, Adv. Mater., 2002, 14, 477.
24 E. J. W. List, R. Guentner, P. S. de Freitas and U. Scherf, Adv.
Mater., 2002, 14, 374.
A novel fully spiro-functionalized PF derivative containing a
spiroanthracenefluorene unit has been synthesized. The bulky
spiroanthracenefluorene structure improved the thermal and
optical properties of the resulting polymer. The polymer
showed a deep blue emission with a high spectral stability
against heat treatment, UV irradiation, and high current
passage. An EL device based on the polymer showed good
color coordinates with CIE 1931 x ~ 0.17 and y ~ 0.12 and a
maximum luminance over 1600 cd m22. These favorable
thermal and optical properties suggest that polymers contain-
ing spiroanthracenefluorenes represent promising candidate
materials for commercial PLED applications.
25 J. M. Lupton, M. R. Craig and E. W. Meijer, Appl. Phys. Lett.,
2002, 80, 4489.
26 G. Zeng, W.-L. Yu, S.-J. Chua and W. Huang, Macromolecules,
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27 M. Gaal, E. J. W. List and U. Sherf, Macromolecules, 2003, 36,
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28 J. Pei, X.-L. Liu, Z.-K. Chen, X.-H. Zhang, Y.-H. Lai and
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29 F.-I. Wu, R. Dodda, D. S. Reddy and C.-F. Shu, J. Mater. Chem.,
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30 G. Kla¨rner, M. H. Davey, W.-D. Chen, J. C. Scott and
R. D. Miller, Adv. Mater., 1998, 10, 993.
Acknowledgements
The authors would like to thank Dr. Soo-Hyoung Lee of
Samsung Advanced Institute of Technology for helpful
discussion.
31 G. Kla¨rner, J.-I. Lee, V. Y. Lee, E. Chan, J.-P. Chen, A. Nelson,
D. Makiewicz, R. Siemens, J. C. Scott and R. D. Miller, Chem.
Mater., 1999, 11, 1800.
32 D. Marsitzky, J. Murray, J. C. Scott and K. R. Carter, Chem.
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