Multi-step reaction with 18 steps
1.1: sodium methylate / methanol / 20 °C / Inert atmosphere
2.1: toluene-4-sulfonic acid / N,N-dimethyl-formamide / 60 °C / Inert atmosphere
3.1: di(n-butyl)tin oxide / toluene / Inert atmosphere; Reflux
3.2: 20 h / 20 °C / Inert atmosphere
4.1: sodium hydride / N,N-dimethyl-formamide / 0.17 h / 0 °C / Inert atmosphere
4.2: 20 °C / Inert atmosphere
5.1: diisobutylaluminium hydride / dichloromethane; toluene / 3 h / -78 - 20 °C / Inert atmosphere
6.1: oxalyl dichloride; dimethyl sulfoxide / tetrahydrofuran / 2 h / -60 - -40 °C / Inert atmosphere
6.2: 2 h / -78 - 20 °C / Inert atmosphere
7.1: n-butyllithium / tetrahydrofuran; hexane / 1.5 h / -78 °C / Inert atmosphere
7.2: -78 - 20 °C / Inert atmosphere
8.1: copper(II) oxide; copper dichloride / dichloromethane; water / 4 h / 20 °C / Inert atmosphere
9.1: lithium aluminium tetrahydride / tetrahydrofuran / 4.17 h / -78 °C / Inert atmosphere
10.1: di(n-butyl)tin oxide / toluene / Inert atmosphere; Reflux
10.2: 20 h / 20 °C / Inert atmosphere
11.1: sodium hexamethyldisilazane; N-(5-chloropyridin-2-yl)-1,1,1-trifluoro-N-[(trifluoromethyl)sulphonyl]methanesulphonamide / tetrahydrofuran / 0.2 h / -78 °C / Inert atmosphere
11.2: 20 °C / Inert atmosphere
12.1: trifluoroacetic acid; water / dichloromethane / 3 h / -35 - -25 °C / Inert atmosphere
13.1: lithium aluminium tetrahydride / tetrahydrofuran / 1.5 h / -78 - 20 °C / Inert atmosphere
14.1: camphor-10-sulfonic acid / dichloromethane / 20 °C / Inert atmosphere
15.1: boron trifluoride diethyl etherate / dichloromethane / 4 h / 0 - 20 °C / Inert atmosphere
16.1: 2,3-dicyano-5,6-dichloro-p-benzoquinone / dichloromethane; water / 20 °C / Inert atmosphere
17.1: N-ethyl-N,N-diisopropylamine; dmap / dichloromethane / 4 h / 20 °C / Inert atmosphere
18.1: trifluoromethylsulfonic anhydride; 2,4,6-tri-tert-butylpyrimidine; 1,1'-sulfinylbisbenzene / dichloromethane / 1 h / -78 °C / Inert atmosphere
18.2: 2 h / -78 - 20 °C / Inert atmosphere
With
dmap; lithium aluminium tetrahydride; n-butyllithium; oxalyl dichloride; trifluoromethylsulfonic anhydride; 1,1'-sulfinylbisbenzene; camphor-10-sulfonic acid; boron trifluoride diethyl etherate; water; sodium methylate; sodium hexamethyldisilazane; sodium hydride; diisobutylaluminium hydride; di(n-butyl)tin oxide; toluene-4-sulfonic acid; dimethyl sulfoxide; N-(5-chloropyridin-2-yl)-1,1,1-trifluoro-N-[(trifluoromethyl)sulphonyl]methanesulphonamide; N-ethyl-N,N-diisopropylamine; trifluoroacetic acid; 2,3-dicyano-5,6-dichloro-p-benzoquinone; copper(II) oxide; copper dichloride; 2,4,6-tri-tert-butylpyrimidine;
In
tetrahydrofuran; methanol; hexane; dichloromethane; water; N,N-dimethyl-formamide; toluene;
6.1: |Swern Oxidation;
DOI:10.1016/j.tet.2013.04.094