NEOPENTASILANE

Base Information

• Chemical Name: NEOPENTASILANE
• CAS No.: 15947-57-6
• Molecular Formula: H12Si5
• Molecular Weight: 152.523
• Mol file: 15947-57-6.mol

Synonyms:pentasilane;Trisilane,2,2-disilyl;neo-pentasilane;Si(SiH3)4 cluster;

Chemical Property of NEOPENTASILANE

Chemical Property:

• Boiling Point: 132-134°C
• PSA: 0.00000
• LogP: -5.11640

Purity/Quality:

99% ^*data from raw suppliers

Safty Information:

• Pictogram(s):  
• Hazard Codes: 

MSDS Files:

SDS file from LookChem

Useful:

Technology Process of NEOPENTASILANE

There total 2 articles about NEOPENTASILANE which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 55.0%

potassium (7440-09-7) + monosilane (7440-21-3) + Nonafluorobutansulfonsaeure-silylester (135524-36-6) → trisilane (7783-26-8,134303-33-6) + disilane (1590-87-0) + isotetrasilane (13597-87-0) + neopentasilane (15947-57-6)

Guidance literature:

In diethylene glycol dimethyl ether; byproducts: H2; further intermediate: KSiH3; under N2, dispersion of potassium reacts with SiH4 at 100°C, concd. in vacuo at 30°C, C4F9SO3SiH3 added at -60°C, stored at this temp. for 10 min, warmed to 40°C; volatiles removed over 3 h in vacuo, SiH4 removed; GC;

Reference yield: 55.0%

sodium (7440-23-5) + monosilane (7440-21-3) + Nonafluorobutansulfonsaeure-silylester (135524-36-6) → trisilane (7783-26-8,134303-33-6) + disilane (1590-87-0) + isotetrasilane (13597-87-0) + neopentasilane (15947-57-6)

Guidance literature:

In diethylene glycol dimethyl ether; byproducts: H2; further intermediate: NaSiH3; under N2, dispersion of sodium reacts with SiH4 at 100°C, concd. in vacuo at 30°C, C4F9SO3SiH3 added at -60°C, stored at this temp. for 10 min, warmed to 40°C; volatiles removed over 3 h in vacuo, SiH4 removed; GC;

Reference yield:

neopentasilane (15947-57-6) → silicon (7440-21-3)

Guidance literature:

In gaseous matrix; a bubbler used with H2 carrier (with flow of 3 l/min) to introduce neopentasilane to chamber, bubbler temp. 35 °C, chamber pressure 6 torr, growth temp. 600, 650, 700 °C;

DOI:10.1063/1.2897325

upstream raw materials:

potassium

monosilane

Nonafluorobutansulfonsaeure-silylester

sodium

Downstream raw materials:

silicon

Refernces