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12627-41-7

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Basic Information
CAS No.: 12627-41-7
Name: TUNGSTENSILICIDE
Molecular Structure:
Molecular Structure of 12627-41-7 (TUNGSTENSILICIDE)
Formula: H4SiW
Molecular Weight: 215.96
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Chemistry

Systematic Name: Tungsten silicide 
Molecular Formula: Si . W
 Tungsten silicide (CAS NO.12627-41-7) is composed of two substances,so the molecular structure of it is:

Specification

 A semiconductor manufacturing process for depositing a tungsten silicide film on a substrate includes deposition of a Tungsten silicide nucleation layer on the substrate using a (CVD) process with a silane source gas followed by deposition of the Tungsten silicide film with a dichlorosilane source gas. This two step process allows dichlorosilane to be used as a silicon source gas for depositing a Tungsten silicide film at a lower temperature than would otherwise by possible and without plasma enhancement. Tungsten silicide (CAS NO.12627-41-7) films deposited by this process are characterized by low impurities, good step coverage, and low stress with the silicon substrate.