12039-95-1 Usage
Description
Tungsten silicide is a chemical compound composed of tungsten and silicon, characterized by its bluish-gray color and hardness. It is a very hard solid that can be attacked by fused alkalies and mixtures of nitric and hydrofluoric acids.
Uses
Used in Electronics Industry:
Tungsten silicide is used as a contact material for its high electrical conductivity and thermal stability, making it suitable for applications in the electronics industry, such as in semiconductor devices and integrated circuits.
Used in Automotive Industry:
In the automotive industry, tungsten silicide is utilized as a component in high-temperature applications, such as in engine components and exhaust systems, due to its excellent thermal and mechanical properties.
Used in Aerospace Industry:
Tungsten silicide is employed in the aerospace industry for its high-temperature resistance and strength, making it an ideal material for components in jet engines, rocket engines, and other high-performance systems.
Used in Tool and Die Industry:
Due to its hardness and wear resistance, tungsten silicide is used in the tool and die industry for manufacturing cutting tools, dies, and other components that require high durability and resistance to wear.
Used in Chemical Industry:
In the chemical industry, tungsten silicide is used as a catalyst in various chemical reactions, taking advantage of its chemical stability and resistance to corrosion.
Used in Energy Industry:
Tungsten silicide is utilized in the energy industry, particularly in solar cells and other photovoltaic applications, due to its ability to absorb and convert light into electrical energy efficiently.
Check Digit Verification of cas no
The CAS Registry Mumber 12039-95-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,2,0,3 and 9 respectively; the second part has 2 digits, 9 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 12039-95:
(7*1)+(6*2)+(5*0)+(4*3)+(3*9)+(2*9)+(1*5)=81
81 % 10 = 1
So 12039-95-1 is a valid CAS Registry Number.
InChI:InChI=1/3Si.5W
12039-95-1Relevant articles and documents
Composition of tungsten silicide films deposited by dichlorosilane reduction of tungsten hexafluoride
Hara,Miyamoto,Hagiwara,Bromley,Harshbarger
, p. 2955 - 2959 (2008/10/08)
The composition profile of tungsten silicide (WSix) films deposited by low-pressure chemical vapor deposition employing dichlorosilane (DCS) reduction of tungsten hexafluoride (WF6) is studied. Diffusion is the reaction rate-limiting process at chuck temperatures above 550°C and uniform in-depth composition profiles can be obtained. Below 550°C, however, the in-depth composition profile is not uniform for the surface reaction rate-limiting process. Tungsten-rich layers with a Si composition, x, of 1.5, are initially deposited due to the reduction of WF6 by the Si surface. This layer is amorphous or microcrystalline. Thereafter, the silicon content of the film increases with increasing thickness and a uniform composition profile is obtained as determined by the DCS/WF6 flow rate ratio in the chemical reaction. Chemical vapor-deposited tungsten silicide (WSix) films have been extensively used as polycide gate and interconnections for very large-scale integrated circuits.
