12116-66-4Relevant articles and documents
Druce, P. M.,Kingston, B. M.,Lappert, M. F.,Spalding, T. R.,Srivastava, R. C.
, (1969)
PREPARATION AND CHEMICAL BEHAVIOUR OF HALOCYCLOPENTADIENYL-ZIRCONIUM(III) AND -HAFNIUM(III)
Cuenca, T.,Royo, P.
, p. 61 - 68 (1985)
Reduction of (η5-C5H5)2MCl2 (M=Zr, Hf) with one equivalent of Na/Hg gives 5-C5H5)2M(μ-Cl)>2.The zirconium(III) complex is also obtained from reactions between LiCp and 2>2 (L2=2P-n-Bu3, dppe) or solutions of ZrCl4 previously reduced with Na/Hg.These zirconium(III) and hafnium(III) complexes are oxidized by AgBF4 or TlBF4 to the cationic 5-C5H5)2M(μ-Cl)>22+ complexes, which react with monodentate ligands to give 5-C5H5)MClL>+ (L=OPPh3, NHPh2) and with bidentate ligands to give dinuclear cationic derivatives5-C5H5)2MCl>2(μ-L-L)>2+ (L-L-dppe, 2,2'-bipyridine).Similar complexes can also be obtained from (η5-C5H5)2MCl2 by halide abstraction with a silver salt.Oxidation of zirconium(III) and hafnium(III) derivatives with halogens gives (η5-C5H5)MClX (X=Cl, Br) and 5-C5H5)2ZrCl(OPPh3)>I3.Conductivity, magnetic susceptibility and IR and NMR data are discussed.
THERMAL DECOMPOSITION OF BIS(CYCLOPENTADIENYL)HAFNIUM COMPOUNDS AND THEIR DEUTERATED ANALOGUES
Razuvaev, G. A.,Mar'In, V. P.,Drushkov, O. N.,Vyshinskaya, L. I.
, p. 125 - 136 (1982)
Thermal decomposition ranges of Cp2HfR2 (R=Me, Ph) have been found by the DTA method.The thermal stability of hafnium derivatives greatly exceeds the stability of analogous titanium and zirconium compounds.Decomposition of Cp2HfR2 occurs by abstraction of ?-bonded groups which convert into RH.Hydrogen donors for the RH formation are both ?-cyclopentadienyl and ?-bonded groups.The initial ?-Cp2Hf structure rearranges to form the (η5-Cp)-(η5,η1-C5H4)Hf fragment.These react with HCl to produce Cp2HfCl2.It has been established that hydrogen exchange between cyclopentadienyl rings and methyl groups occurs during the thermal decomposition of Cp2HfMe2.As a result of the exchange process on thermal decomposition of Cp2HfMe2-d6, deuterium insertion into the cyclopentadienyl ring has been shown.The participation of solvent during the decomposition process of the hafnium derivatives has been studied.
Photoresist based on metallocene compound and preparation method and application thereof
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Paragraph 0101; 0109; 0110-0111, (2021/05/26)
The invention belongs to the technical field of photoresist, and particularly relates to a photoresist based on a metallocene compound as well as a preparation method and application of the photoresist. The metallocene compound disclosed by the invention adopts metal as a central core structure, so that the metallocene compound has a relatively high melting point and glass-transition temperature, can meet the requirements of a photoetching technology, and is stable in structure, and a film structure is not changed during high-temperature baking. In addition, the photoresist composition provided by the invention can be used in modern photoetching processes such as 248nm photoetching, 193nm photoetching, extreme ultraviolet (EUV) photoetching, nanoimprint lithography (NIL), electron beam lithography (EBL) and the like, and is particularly suitable for being used in an extreme ultraviolet (EUV) photoetching process.
Group 4 metallocene complexes with pendant nitrile groups
Pinkas, Ji?í,Gyepes, Róbert,Kubi?ta, Ji?í,Horá?ek, Michal,Lama?, Martin
, p. 2364 - 2372 (2011/06/26)
The preparation of a new functionalized cyclopentadienyl ligand bearing a nitrile pendant substituent, (C5H4CMe2CH 2CN)- is reported. The corresponding lithium salt of this ligand (1) was prepared by the reaction of in situ lithiated acetonitrile with 6,6-dimethylfulvene. The ligand was subsequently utilized for the synthesis of group 4 metal complexes [(η5-C5H4CMe 2CH2CN)2MCl2] (M = Ti, 2; M = Zr, 3; M = Hf, 4), [(η5-C5H5) (η5-C5H4CMe2CH 2CN)MCl2] (M = Ti, 7; M = Zr, 8), and [(η5- C5Me5) (η5 C5H 4CMe2CH2CN)2ZrCl2] (9). Alternative route to 2 comprised the preparation of half-sandwich complex [(η5-C5H4CMe2CH 2CN)TiCl3] (6). The prepared compounds were characterized by common spectroscopic methods and the solid state structures of complexes 2, 3, 4, 7, and 9 were determined by the single-crystal X-ray diffraction analysis. In addition, compound 7 was converted to the corresponding dimethyl derivative [(η5-C5H5) (η5-C 5H4CMe2CH2CN)TiMe2] (10) and also treated with the chloride anion abstractor Li[B(C6F 5)4] to generate the cationic complex with the coordinated nitrile group, as suggested by the NMR spectroscopy. A formation of yet another cationic complex was observed upon treating compound 10 with (Ph 3C)[B(C6F5)4].
