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1250907-27-7

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1250907-27-7 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 1250907-27-7 includes 10 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 7 digits, 1,2,5,0,9,0 and 7 respectively; the second part has 2 digits, 2 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 1250907-27:
(9*1)+(8*2)+(7*5)+(6*0)+(5*9)+(4*0)+(3*7)+(2*2)+(1*7)=137
137 % 10 = 7
So 1250907-27-7 is a valid CAS Registry Number.

1250907-27-7Downstream Products

1250907-27-7Relevant articles and documents

Covalent Organic Framework as a Heterogeneous Ligand for the Regioselective Oxidative Heck Reaction

Han, Jiyao,Sun, Xiaowei,Wang, Xiao,Wang, Qiong,Hou, Shenghuai,Song, Xin,Wei, Yingqin,Wang, Rongyu,Ji, Wenhua

supporting information, p. 1480 - 1484 (2020/03/13)

A simple imine-based covalent organic framework (COF) as heterogeneous ligand for PdII-promoted Heck reaction is reported. Good regioselectivity for a wide range of electronically unbiased olefins is obtained (linear/branched >100:1 in most cases). Related tests and density functional theory calculations are used to explore the reason underlying the high selectivity. This research opens a route for COF as an intriguing platform to control regioselectivity catalysis.

Thiophene-Alkyne-Based CMPs as Highly Selective Regulators for Oxidative Heck Reaction

Li, Ren-Hao,Ding, Zong-Cang,Li, Cun-Yao,Chen, Jun-Jia,Zhou, Yun-Bing,An, Xiao-Ming,Ding, Yun-Jie,Zhan, Zhuang-Ping

, p. 4432 - 4435 (2017/09/11)

Thiophenes containing an adjacent C≡C group as ligands for PdII-promoted organic reactions are reported for the first time. These ligands were utilized as catalytic sites and integrated into the skeleton of conjugated microporous polymers. By e

Allylsilanes in "tin-free" oximation, alkenylation, and allylation of alkyl halides

Rouquet, Guy,Robert, Frederic,Mereau, Raphael,Castet, Frederic,Landais, Yannick

supporting information; experimental part, p. 13904 - 13911 (2012/01/15)

Tin-free oximation, vinylation, and allylation of alkyl halides have been developed by using allylsilanes as di-tin surrogates. Initiation of the radical process with a peroxide provides the silyl radical, which can abstract a halogen from the corresponding alkyl halide. The resulting carbon-centered radical then adds to various acceptors, including a sulfonyloxime, a vinylsulfone, and an allylsulfone, leading to formation of the desired products along with the corresponding allylsulfone resulting from the reaction of the PhSO2 radical with the allylsilane precursor. Better results were generally obtained with methallylsilane 1b than with 1a. This observation was rationalized by invoking the higher nucleophilicity of 1b and the faster β-fragmentation of the corresponding β-silyl radical intermediate. Calculation of the energy barrier for the β-fragmentation of a series of β-silyl radicals at the DFT level supported this hypothesis. Finally, a second version of these oximation and vinylation reactions, based on the utilization of 3-tris(trimethylsilyl)silylthiopropene, was devised, affording the desired oximes and olefins in reasonable yields. This strategy allowed the title reaction to be performed under milder conditions (AIBN, benzene, 80°C), as a result of the easier β-fragmentation of the C-S bond as compared with the C-Si bond.

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