134-23-6 Usage
Description
THIOSALICYLIC ACID SODIUM SALT is an organic compound with the chemical formula C7H5NO2SNa. It is a sodium salt derivative of thiosalicylic acid, which is a sulfur-containing analog of salicylic acid. THIOSALICYLIC ACID SODIUM SALT is known for its complexing properties and is utilized in various chemical reactions and processes.
Uses
Used in Chemical Synthesis:
THIOSALICYLIC ACID SODIUM SALT is used as a complexing agent in the lithiation process, which involves the formation of organolithium compounds. These organolithium compounds are crucial intermediates in organic synthesis, particularly for the synthesis of various organic molecules and pharmaceuticals.
Used in Organic Chemistry Oxidative Coupling:
In the field of organic chemistry, THIOSALICYLIC ACID SODIUM SALT is utilized as a complexing agent for the oxidative coupling of terminal acetylenes to diynes. This reaction is essential for the formation of conjugated systems and the synthesis of complex organic molecules, such as natural products and advanced materials.
Used in Organic Chemistry Orthometallation:
THIOSALICYLIC ACID SODIUM SALT is also used with alkyllithiums in the orthometallation of aromatics. Orthometallation is a crucial reaction in organic chemistry that allows for the selective functionalization of aromatic rings, leading to the synthesis of various aromatic compounds with potential applications in pharmaceuticals, agrochemicals, and materials science.
Check Digit Verification of cas no
The CAS Registry Mumber 134-23-6 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 1,3 and 4 respectively; the second part has 2 digits, 2 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 134-23:
(5*1)+(4*3)+(3*4)+(2*2)+(1*3)=36
36 % 10 = 6
So 134-23-6 is a valid CAS Registry Number.
InChI:InChI=1/C7H6O2S.Na/c8-7(9)5-3-1-2-4-6(5)10;/h1-4,10H,(H,8,9);/q;+1/p-1
134-23-6Relevant articles and documents
Radiation-sensitive resin composition and method for forming pattern
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Paragraph 0193-0194; 0196, (2021/07/27)
Provided are a radiation-sensitive resin composition capable of exhibiting an adequate level of sensitivity, CDU performance, and LWR performance, and a method for forming a pattern. The radiation-sensitive resin composition includes the onium salt compound represented by formula (1'), a resin including a structural unit having an acid-cleavable group, and a solvent. (Here, EA is a substituted or unsubstituted, ([alpha]+[beta])-valent organic group having 1 to 40 carbon atoms; Z+ is a monovalent radiation-sensitive onium cation; and [alpha] and [beta] are each independently 1 or 2.).
