19782-68-4 Usage
Description
TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) is a chemical compound that serves as a precursor for atomic layer deposition (ALD) of Hafnium Oxide nanolaminates. These nanolaminates are utilized as a replacement for Silicon oxide in semiconductor devices, offering enhanced performance and reliability.
Uses
Used in Semiconductor Industry:
TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) is used as a precursor for atomic layer deposition (ALD) of Hafnium Oxide nanolaminates. The application reason is to improve the performance and reliability of semiconductor devices by replacing Silicon oxide with Hafnium Oxide nanolaminates.
For bulk quantity, pricing, and packaging options, please inquire with the supplier or manufacturer.
Check Digit Verification of cas no
The CAS Registry Mumber 19782-68-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,9,7,8 and 2 respectively; the second part has 2 digits, 6 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 19782-68:
(7*1)+(6*9)+(5*7)+(4*8)+(3*2)+(2*6)+(1*8)=154
154 % 10 = 4
So 19782-68-4 is a valid CAS Registry Number.
InChI:InChI=1/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4/rC8H24HfN4/c1-10(2)9(11(3)4,12(5)6)13(7)8/h1-8H3