2268-31-7

Basic information

• Product Name: (Z)-1-Fluoro-2-chloroethene
• Synonyms: (Z)-1-Chloro-2-fluoroethene;(Z)-1-Fluoro-2-chloroethene;(Z)-1-Chloro-2-fluoroethene, cis-1-Chloro-2-fluoroethylene;(Z)-1-Chloro-2-fluoroethylene 99%;(Z)-1-Chloro-2-fluoroethylene;(Z)-1-Chloro-2-fluoroethylene99%
• CAS NO: 2268-31-7
• Molecular Formula: C₂H₂ClF
• Molecular Weight: 80.4887
• Mol File: 2268-31-7.mol
• Article Data: 4

Chemical Properties

• Boiling Point: 10.5°Cat760mmHg
• Flash Point: °C
• Appearance: /
• Density: 1.117g/cm³
• CAS DataBase Reference: (Z)-1-Fluoro-2-chloroethene(CAS DataBase Reference)
• NIST Chemistry Reference: (Z)-1-Fluoro-2-chloroethene(2268-31-7)
• EPA Substance Registry System: (Z)-1-Fluoro-2-chloroethene(2268-31-7)

Safety Data

• Hazardous Substances Data: 2268-31-7(Hazardous Substances Data)

Usage

Description

(Z)-1-Fluoro-2-chloroethene, also known as hexafluoropropylene, is a chemical compound with the molecular formula C3H2ClF. It is a colorless gas with a sweet, chloroform-like odor and is characterized by its high reactivity and flammability. (Z)-1-Fluoro-2-chloroethene is primarily used as a monomer in the production of fluoropolymers, which are known for their exceptional properties such as chemical resistance, thermal stability, and non-stick surfaces.

Uses

Used in Chemical Industry:
(Z)-1-Fluoro-2-chloroethene is used as a monomer for the production of fluoropolymers due to its high reactivity and ability to form stable polymer chains. These fluoropolymers are widely utilized in various applications, including non-stick coatings, electrical insulation, and chemical-resistant materials.
Used in Electronics Industry:
In the electronics industry, (Z)-1-Fluoro-2-chloroethene is used as a monomer to produce fluoropolymers that serve as effective insulators and protective coatings for electrical components. These materials offer excellent dielectric properties and resistance to high temperatures, making them ideal for use in electronic devices and equipment.
Used in Automotive Industry:
(Z)-1-Fluoro-2-chloroethene is used as a monomer in the automotive industry to produce fluoropolymers that are employed in the manufacturing of seals, gaskets, and other components that require high resistance to chemicals, heat, and wear. These fluoropolymers contribute to the durability and performance of automotive parts.
Used in Aerospace Industry:
In the aerospace industry, (Z)-1-Fluoro-2-chloroethene is used as a monomer to create fluoropolymers that are utilized in the production of components that require exceptional thermal stability, chemical resistance, and low-friction properties. These materials are essential for the performance and safety of aerospace equipment.
It is crucial to handle and store (Z)-1-Fluoro-2-chloroethene with caution due to its flammability and potential health risks. Proper safety protocols must be followed to minimize the risk of accidents and exposure, ensuring the safe and effective use of this compound in various industries.

Upstream product

• 430-57-9 1,2-dichloro-1-fluoroethane 
• 79-38-9 Chlorotrifluoroethylene 
• 13245-54-0 1,2-dichlorofluoroethylene 

Downstream Products

• 6180-22-9 1-(Chloroethynyl)cyclohexan-1-ol 

Relevant articles and documents

Organocatalytic C?F Bond Activation with Alanes

Hydrodefluorination reactions (HDF) of per- and polyfluorinated olefins and arenes by cheap aluminum alkyl hydrides in non-coordinating solvents can be catalyzed by O and N donors. TONs with respect to the organocatalysts of up to 87 have been observed. Depending on substrate and concentration, high selectivities can be achieved. For the prototypical hexafluoropropene, however, low selectivities are observed (E/Z≈2). DFT studies show that the preferred HDF mechanism for this substrate in the presence of donor solvents proceeds from the dimer Me4Al2(μ-H)2?THF by nucleophilic vinylic substitution (SNV)-like transition states with low selectivity and without formation of an intermediate, not via hydrometallation or σ-bond metathesis. In the absence of donor solvents, hydrometallation is preferred but this is associated with inaccessibly high activation barriers at low temperatures. Donor solvents activate the aluminum hydride bond, lower the barrier for HDF significantly, and switch the product preference from Z to E. The exact nature of the donor has only a minimal influence on the selectivity at low concentrations, as the donor is located far away from the active center in the transition states. The mechanism changes at higher donor concentrations and proceeds from Me2AlH?THF via SNV and formation of a stable intermediate, from which elimination is unselective, which results in a loss of selectivity.

CO2 Laser-induced Decomposition of 1,2-Dichloro-1-fluoroethane

CH2ClCHFCl was photolyzed with a TEA CO2 laser at 1033.5 cm-1.The infrared multiphoton dissociation mechanism of CH2ClCHFCl was investigated under various conditions: Sample gas pressure, additive gas presure, pulse number, pulse energy, and pulse duration.It is concluded that primary process of the IRMPD is direct eleimination of molecular HCl and HF, HCl elimination being predominant channel.Primary HCl elimination products cis-and trans-CHF=CHCl, and CH2=CFCl are formed at high vibrational levels, from which additional photon absorption occures in the secondary photolysis to give rise to CH=CCl, CH=CF, and CH2=CHF.All of the secondary products are concluded to be derived from mainly CH2=CFCl among the chlorofluoroethene isomers.CH2=CFCl decomposes via HF and HCl elimination channels together with the C-Cl bond repture channel. appears to be generated by the H atom abstraction reaction of C2H. radical, which may result from further decomposition of and/or .The neat IRMPD at higher pressures gives quite similar primary product distribution, but markedly different secondary product distribution from those in shock tube pyrolysis.