2288-13-3Relevant articles and documents
Hydrocarbyltrialkoxysilanes reaction with fluoroptotatrane
Voronkov,Kuznetsova
, (2013)
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ETCHANT COMPOSITION, METHOD OF ETCHING INSULATING FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SILANE COMPOUND
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Paragraph 0080-0083, (2019/12/06)
An etchant composition includes a silane compound represented by the following Chemical Formula 1: wherein R1 to R6 are independently hydrogen, halogen, a substituted or unsubstituted C1-C20 hydrocarbyl group, a phenyl group, a C1-C20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri (C1-C20) alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C1-C3 hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.
A novel route to pentacoordinated organylsilanes and -germanes
Gevorgyan, Vladimir,Borisova, Larisa,Vyater, Armand,Ryabova, Victoria,Lukevics, Edmunds
, p. 149 - 155 (2007/10/03)
New convenient methods of sila- and germatranes synthesis from ethoxy- and tetraorganylsilanes and -germanes have been elaborated. The reaction of ethoxysilanes with boratrane in the presence of catalytic amounts of metal alcoholates has been investigated. Dimethylformamide (DMF) as a solvent and NaOEt as a catalyst used instead of xylene and Al(Oi-Pr)3 were found to give better yields. The possibility of using alkoxy-, aminosilanes, tetraethoxygermane and even tetraorganylsilanes in this reaction leading to the corresponding atranes with good yields has been demonstrated. Triethanolamine in the presence of catalytic amounts of base or CsF easily substitutes furyl-, dihydrofuryl-, dihydropyranyl- and thienyl groups in tris- and tetraheterylsilanes, leading to organylsilatranes with good to excellent yields.