25330-21-6

Basic information

• Product Name: (1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol
• Synonyms: (1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol;Isocalamendiol
• CAS NO: 25330-21-6
• Molecular Formula: C15H26O2
• Molecular Weight: 238.36574
• Mol File: 25330-21-6.mol
• Article Data: 2

Chemical Properties

• Appearance: /
• CAS DataBase Reference: (1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol(CAS DataBase Reference)
• NIST Chemistry Reference: (1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol(25330-21-6)
• EPA Substance Registry System: (1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol(25330-21-6)

Safety Data

• Hazardous Substances Data: 25330-21-6(Hazardous Substances Data)

Usage

General Description

The chemical compound "(1R,8aα)-Decahydro-1-methyl-6-methylene-4β-isopropyl-1α,4aβ-naphthalenediol" is a complex organic molecule with a naphthalene ring and several functional groups attached. It has a bicyclic structure and contains a methyl group, a methylene group, and an isopropyl group, as well as two hydroxyl groups. The compound is a diol, meaning it contains two hydroxyl (OH) groups. This molecule may have potential applications in organic synthesis, pharmaceuticals, or other chemical processes due to its unique structure and functional groups. However, further research and testing would be necessary to determine its specific properties and potential uses.

Upstream product

• 72390-59-1 (1R,4R,4aS,6S,8aR)-6-Hydroxymethyl-4-isopropyl-1-methyl-octahydro-naphthalene-1,4a-diol 
• 1432064-69-1 10-O-acetylisocalamendiol 
• 50281-45-3 acoragermacrone 

Relevant articles and documents

Degradable photoresist resin monomer synthesized from 10-O-acetyl isocalamendiol and synthesis method of degradable photoresist resin monomer

The invention discloses a degradable photoresist resin monomer synthesized from 10-O-acetyl isocalamendiol and a synthesis method of the degradable photoresist resin monomer. The invention relates tothe field of photoresist resin monomers. The structural formula is shown in the specification, wherein R is hydrogen or methyl. The synthesis method comprises the steps: hydrolyzing an ester group in10-O-acetyl isocalamendiol I, and then adjusting the system to be acidic to obtain an intermediate II; under the catalysis of a catalyst a, carrying out addition reaction on unsaturated carbon-carbondouble bonds of the intermediate II and hydrogen to obtain an intermediate III; and carrying out esterification reaction on the intermediate III and another reaction substrate to generate a target resin monomer IV. The novel photoresist resin monomer provided by the invention has better etching resistance, improves the etching resistance, improves the solubility of the exposed resin in a developing solution, is beneficial to improving the edge roughness of a developed pattern, and greatly improves the resolution of the developed pattern.