258872-14-9Relevant articles and documents
RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE
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, (2008/06/13)
A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.