30389-25-4

Basic information

• Product Name: (Perfluorodecyl)ethylene
• Synonyms: 1H,1H,2H-PERFLUORODODEC-1-ENE;1H,1H,2H-PERFLUORO-1-DODECENE;(PERFLUORODECYL)ETHYLENE;(N-Perfluorodecyl)ethylene;1-Dodecene, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-heneicosafluoro-;Perfluorododecene;3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecene;1H,1H,2H-Perfluorododec-1-ene 97%
• CAS NO: 30389-25-4
• Molecular Formula: C₁₂H₃F₂₁
• Molecular Weight: 546.12
• EINECS: 250-173-3
• Mol File: 30389-25-4.mol
• Article Data: 3

Chemical Properties

• Boiling Point: 71-72°C 14mm
• Flash Point: 71-72°C/14mm
• Appearance: /
• Density: 1,711 g/cm3
• Vapor Pressure: 0.979mmHg at 25°C
• Refractive Index: 1.303
• BRN: 2493721
• CAS DataBase Reference: (Perfluorodecyl)ethylene(CAS DataBase Reference)
• NIST Chemistry Reference: (Perfluorodecyl)ethylene(30389-25-4)
• EPA Substance Registry System: (Perfluorodecyl)ethylene(30389-25-4)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26-36
• HazardClass: IRRITANT
• Hazardous Substances Data: 30389-25-4(Hazardous Substances Data)

Usage

Description

(Perfluorodecyl)ethylene, also known as 1H,1H,2H-Perfluoro-1-dodecene, is a synthetic compound characterized by its perfluorinated structure. It possesses unique properties such as high chemical stability, low surface energy, and resistance to water and oils. These characteristics make it a versatile material for various applications.

Uses

Used in Surface Modification Industry:
(Perfluorodecyl)ethylene is used as a surface modifier for enhancing the properties of materials. Its application reason is due to its low surface energy, which provides excellent water and oil repellency, making it suitable for creating non-stick surfaces and improving the durability and performance of materials.
Used in Photoresist Coating Industry:
(Perfluorodecyl)ethylene is used as a key component in the preparation method of coating for surface modification of photoresist. The application reason is its ability to impart specific surface properties to the photoresist, such as increased resistance to etching or improved adhesion, which can be crucial for the performance of microelectronic devices and other applications that rely on photoresist technology.

InChI:InChI=1/C12H3F21/c1-2-3(13,14)4(15,16)5(17,18)6(19,20)7(21,22)8(23,24)9(25,26)10(27,28)11(29,30)12(31,32)33/h2H,1H2

Upstream product

• 2043-54-1 1-iodo-1H,1H,2H,2H-perfluorododecane 
• 423-62-1 1-Iodo-perfluorodecane 
• 2043-57-4 1,1,1,2,2,3,3,4,4,5,5,6,6-Tridecafluoro-8-iodooctane 
• 2043-53-0 2-(n-perfluorooctyl)ethyl iodide 
• 30046-31-2 1-iodo-1H,1H,2H,2H-perfluorotetradecane 
• 10192-85-5 potassium acrylate 
• 116-14-3 polytetrafluoroethylene 
• 74-85-1 ethene 
• 354-64-3 Pentafluoroethyl iodide 

Downstream Products

• 146090-84-8 1H,1H,2H,2H-perfluorododecyltriethoxysilane 
• 123445-18-1 (1H,1H,2H,2H-henicosafluorododecyl)trimethoxysilane 
• 102488-49-3 trichloro-(1H,1H,2H,2H-henicosafluorododecyl)silane 

Relevant articles and documents

PROCESS FOR PRODUCING FLUORINATED (METH)ACRYLIC ESTER

A mixture of fluoroalkyl iodides of the formula C2F5(CF2CF2)nI ( n is an integer of ≥0) wherein the sum of such fluoroalkyl iodides of n=3 and n=4 contained is ≥85 mol% is provided. This mixture is subjected to an ethylene addition step and an esterification step, and C2F5(CF2CF2)nCH=CH2 and C2F5(CF2CF2)nCH2CH2OH are removed. Thus, there can be obtained a mixture of fluorine-containing (meth)acrylic esters of the formula C2F5(CF2CF2)nCH2CH2OCOCR1=CH2 (wherein R1 represents a hydrogen atom or a methyl group, and n is an integer of ≥0) wherein the content of impurities (namely, olefins of the formula C2F5(CF2CF2)nCH=CH2 and alcohols of the formula C2F5(CF2CF2)nCH2CH2OH) is low.

Application of trimethylvinylsilane as a convenient synthetic precursor of (perfluoroalkyl)ethenes: An unusual fluoride-induced elimination-desilylation coupled reaction

(equation presented) A convenient and effective method for the preparation of perfluoroalkylated ethenes is described. First, the free radical addition of perfluoroalkyl iodides to trimethylvinylsilane in the presence of AIBN gave iodoethylsilane intermediates (F(CF2)nCH2CHISiMe3, n = 4 (1), 6 (2),8 (3), 10 (4); 94-99%). Then an unusual dehydrohalogenation-desilylation reaction was effected by tetrabutylammonium fluoride, and finally the product isolation (F(CF2)nCH=CH2 (5-8), 62-87%) was facilitated using a fluorous phase separation technique. This novel approach can also be applied to adjust short C2 hydrocarbon units to functionalized fluorinated segments (e.g., HOCH2(CF2)8CH=CH2 (11), 71%). All structures were verified by state-of-the-art multinuclear one- and two-dimensional NMR experiments involving both homo-(19F-19F) and heteronuclear (1H-13C, 19F-13C) correlations based on the GMQFCOPS and inverse 1H and/or 19F detected GHSQC, GHMQC sequences with broad-band adiabatic 13C decoupling.