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38225-32-0

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38225-32-0 Usage

General Description

Lithium isopropylamide is a strong base and nucleophile used in organic synthesis. It is a solid compound that is highly reactive and sensitive to air, moisture, and heat. This chemical is commonly used as a strong base in organic reactions, particularly in the deprotonation of acidic protons to form carbon nucleophiles. Lithium isopropylamide is also used in the preparation of a wide range of organic compounds, including pharmaceuticals, agrochemicals, and specialty chemicals. However, it must be handled with extreme care due to its highly reactive and hazardous nature.

Check Digit Verification of cas no

The CAS Registry Mumber 38225-32-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 3,8,2,2 and 5 respectively; the second part has 2 digits, 3 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 38225-32:
(7*3)+(6*8)+(5*2)+(4*2)+(3*5)+(2*3)+(1*2)=110
110 % 10 = 0
So 38225-32-0 is a valid CAS Registry Number.

38225-32-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 20, 2017

Revision Date: Aug 20, 2017

1.Identification

1.1 GHS Product identifier

Product name lithium,propan-2-ylazanide

1.2 Other means of identification

Product number -
Other names EINECS 253-836-5

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:38225-32-0 SDS

38225-32-0Upstream product

38225-32-0Relevant articles and documents

Metal precursor compound including imido group

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Paragraph 0059-0060, (2021/05/25)

Provided is a substrate having excellent reactivity with a substrate. Are a metal precursor compound capable of forming a metal thin film having a low impurity content in a wide temperature range, and a method for depositing a metal film using the same. The metal precursor compound for deposition of the metal layer is represented by Chemical Formula 1. , Chemical Formula 2. , Chemical Formula 3. (Wherein R M is a metal selected from the group consisting of Si, Ge and Sn, and is R a metal selected from the group consisting of compounds represented by. 1 Chem. R. 2 And R3 N is independently hydrogen or a C 1 to 5 hydrocarbon group, X and is hydrogen. 1 Is each independently a halogen element.

PHARMACEUTICAL COMPOUNDS

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Page/Page column 149, (2010/11/30)

The invention provides a compound of the formula (I) or a salt, solvate, tautomer or N-oxide thereof for use in the treatment or prophylaxis of a disease state or condition mediated by protein kinase A and/or protein kinase B, wherein the ring Q is a benzene ring; J2-J1 is N=CR7 or R1aN-CO; G is OH or NR5R6; E is CONR7, NR7CO, C(R8)=C(R8) or (X)m(CR8R8a)n where X is O, S or NR7; provided that when J2-J1 is R1aN-CO, E is other than NR7CO; m and n are each 0 or 1, where m + n = 1 or 2; A is a bond and R4 and R4a are absent, or A is a saturated optionally substituted C1-7 hydrocarbon linker group having a maximum chain length of 5 atoms extending between E and G, one carbon atom in the linker group A being optionally replaced by O or N; R1,Rla, R2, and R3 are each H; halogen; C1-6 hydrocarbyl optionally substituted by halogen, OH or C1-2 alkoxy; CN; CONHR8; NH2; NHCOR10 or NHCONHR10; R4 is H or C1-4 alkyl; R4a is H, C1-4 alkyl or a group R9; R5 and R6 are each selected from H, R9 and C1-4 hydrocarbyl optionally substituted by halogen, C1-2 alkoxy or R9;or NR5R6 forms a saturated 4-7 membered monocyclic heterocyclic group; R7 is H or C1-4 alkyl; R8 and R8a each H or saturated C1-4 hydrocarbyl optionally substituted by fluorine; R9is a monocyclic or bicyclic carbocyclic or heterocyclic group containing up to 3 ring heteroatoms selected from N, O and S; or R4, R4a and A together form a saturated monocyclic 4-7 membered heterocycle; or NR5R6, R4 and A form a saturated 4-7 membered monocyclic heterocycle; or R4,together with R7 or R8 and A and E form a 4-7 membered saturated monocyclic heterocycle; or NR5R6 and R7 or R8 together with A and E form a 4-7 membered saturated monocyclic heterocycle; and R10 is optionally substituted phenyl or benzyl.

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