38664-34-5Relevant articles and documents
Study of the gas phase reactions of several perfluorocarbons with positive ions of atmospheric interest
Jarvis, Gary K.,Mayhew, Chris A.,Tuckett, Richard P.
, p. 17166 - 17174 (2007/10/03)
The bimolecular rate coefficients and ion products for the reactions of H3O+, NO+, O2+, H2O+, N2O+, O+, CO2+, CO+, N+, and N2+ with three fluoroalkenes (C2F4, C3F6, and 2-C4F8) and three fully saturated perfluorocarbons (C2F6, C3F8, and n-C4F10) at 300 K are reported. All six perfluorocarbons are found to be unreactive with NO+. C2F6 is also unreactive with O2+, H2O+, and N2O+, and C3F8 and n-C4F10 are also unreactive with O2+. C3F6 is the only perfluorocarbon studied that reacts with H3O+ at a measurable rate. All the other reactions take place at or close to the collisional rate, the exceptions being the reactions of N2O+ with C2F4 and C3F8, and CO2+ with C2F4 and C2F6, for which the experimental rate coefficients show marked departures from the collisional values. It is proposed that most of the reactions proceed through a complex intermediate resulting in electrophilic attack by the ion on the perfluorocarbon. This mechanism generally takes precedent over "long-range" (formal) charge transfer. This work is of possible relevance to atmospheric ion-chemistry and plasma processes and may also be pertinent to the use of chemical ionization mass spectrometers for the trace detection of perflurocarbons in the environment.
Kinetic Energy Dependence of the Reactions of O(1+) and O2(1+) with CF4 and C2F6
Fisher, Ellen R.,Armentrout, P. B.
, p. 6118 - 6124 (2007/10/02)
Guided ion beam techniques are used to measure cross sections as a function of kinetic energy for the reaction of O(1+) and O2(1+) with CF4 and C2F6.The predominant ions formed in these fluorocarbon system correspond to dissociative charge-transfer reactions, with small amounts of FCO(1+) and F2CO(1+) being formed.The thresholds and shapes of dissociative charge-transfer cross sections are explained in terms of vertical ionization to various electronic states of CF4(1+) and C2F6(1+).In the O(1+) reactions, fluoride transfer to form CF3(1+) in the CF4 system and C2F5(1+) in the C2F6 system is also observed at thermal energies.The formation of carbon oxyfluoride ions in these systems is postulated to occur by insertion of the oxygen ions into C-F bonds of the fluorocarbon molecules.From the O2(1+) + CF4 and O(1+) + C2F6 systems, ΔfH(F2CO(1+)) is determined.The relationship of these reactions to plasma deposition and etching is discussed.
