3957-22-0 Usage
Description
5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol) is an organic compound that serves as a versatile intermediate in the synthesis of various organic and pharmaceutical compounds. It is characterized by its unique molecular structure, which features a central isopropylidene bridge connecting two m-xylene-2,alpha,alpha'-triol moieties. This structure endows the compound with specific chemical properties that make it valuable in a range of applications.
Uses
Used in Organic Synthesis:
5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol) is used as an organic synthesis intermediate for the production of various organic compounds. Its unique molecular structure allows for a wide range of chemical reactions, making it a valuable building block in the synthesis of complex organic molecules.
Used in Pharmaceutical Industry:
5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol) is also used as a pharmaceutical intermediate, playing a crucial role in the development of new drugs and therapeutic agents. Its chemical properties enable it to be incorporated into the structures of various pharmaceutical compounds, potentially leading to the discovery of novel medications with improved efficacy and safety profiles.
Used in Laboratory Research and Development:
In the context of laboratory research and development, 5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol) serves as an essential tool for chemists and researchers. Its unique structure and reactivity make it a valuable compound for exploring new reaction pathways, developing innovative synthetic methods, and advancing the understanding of organic chemistry.
Used in Chemical Production Process:
5,5'-isopropylidenebis(m-xylene-2,alpha,alpha'-triol) is also utilized in the chemical production process, where it contributes to the efficient synthesis of various chemicals and materials. Its role as an intermediate allows for the streamlined production of a wide range of products, from pharmaceuticals to specialty chemicals, ultimately benefiting various industries and applications.
Synthesis
Preparation Example 3. 2,2-bis[4-trimethylsilyloxy-3,5-bis(trimethylsilyloxymethyl)-phenyl]propane (monomer K). a) 2,2-bis[4-hydroxy-3,5-di(hydroxymethyl)phenyl)]propane. 114.4 of bisphenol A (2,2-bis[4-hydroxyphenyl)]propane) were initially charged in a mixture of 450 g of water and 50 g of NaOH. While cooling (Tmax=25°C), 350 g of 30% formaldehyde solution were added dropwise. After continued reaction at room temperature for 1 h, a clear solution was obtained. The mixture was neutralized by adding solid CO2. The resulting solution was saturated with sodium chloride and extracted 3 times with butanol. The extracts were concentrated on a rotary evaporator at 50°C down to 5 mbar. The product was used in the next step without further purification. colorless oil. 1H-NMR 400 MHz, CDCl3, 25°C, TMS δ [ppm] = 7.03 (s, 4 H, Aromat); 5.00 (s, 6 H, -OH (breit)); 4.63 (s, 8H, -CH2-); 1.60 (s, 6 H, C-CH3).
Check Digit Verification of cas no
The CAS Registry Mumber 3957-22-0 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,9,5 and 7 respectively; the second part has 2 digits, 2 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 3957-22:
(6*3)+(5*9)+(4*5)+(3*7)+(2*2)+(1*2)=110
110 % 10 = 0
So 3957-22-0 is a valid CAS Registry Number.
3957-22-0Relevant articles and documents
Synthetic method 2,2 - bis (4 - hydroxyl -3, 5 - dimethylphenyl) propane (by machine translation)
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Paragraph 0019-0026, (2020/12/14)
The invention discloses a synthesis method 2,2 - bis (4 - hydroxyl -3, 5 - dimethylphenyl) propane, wherein bisphenol A and paraformaldehyde are used as raw materials, and the sulfonic acid type MCM - 41 mesoporous solid acid serves as a catalyst to synthesize 2,2 - bis (4 - hydroxyl -3, 5 -dihydroxymethyl phenyl) propane through hydroxylation reaction. The synthesis method is high in yield. The utility model has the advantages of low cost, less three wastes and good product purity. (by machine translation)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
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Paragraph 0458, (2016/10/17)
The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.
CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION
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, (2012/05/20)
Disclosed are a negative resist composition which shows excellent sensitivity and resolution in pattern formation by exposure to electron beams or EUV, a novel crosslinking agent suitable for the resist composition, and a pattern forming method using the resist composition. The negative resist composition comprises: (A) a polyphenol compound comprising two or more phenolic hydroxyl groups in a molecule thereof and having a molecular weight of 300 to 3,000, (B) an acid generator which directly or indirectly produces acid by exposure to active energy rays having a wavelength of 248 nm or less, and (C) a crosslinking agent represented by the following chemical formula (1). (The symbols shown in the formula (1) are defined in the Description).
