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53153-66-5

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53153-66-5 Usage

Safety Profile

Moderately toxic by ingestion. A skin irritant. Low toxicity by skin contact. When heated to decomposition it emits toxic fumes of NOx and CN-.

Check Digit Verification of cas no

The CAS Registry Mumber 53153-66-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,3,1,5 and 3 respectively; the second part has 2 digits, 6 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 53153-66:
(7*5)+(6*3)+(5*1)+(4*5)+(3*3)+(2*6)+(1*6)=105
105 % 10 = 5
So 53153-66-5 is a valid CAS Registry Number.
InChI:InChI=1/C10H17N/c1-3-4-5-6-7-10(2)8-9-11/h8H,3-7H2,1-2H3/b10-8+

53153-66-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name (Z)-3-methylnon-2-enenitrile

1.2 Other means of identification

Product number -
Other names 3-Methyl-non-2-en-1-saeure-nitril

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:53153-66-5 SDS

53153-66-5Downstream Products

53153-66-5Relevant articles and documents

Selective synthesis of sulfoxides and sulfonesviacontrollable oxidation of sulfides withN-fluorobenzenesulfonimide

Cao, Zhong-Yan,Li, Xiaolong,Lu, Hao,Wang, Panpan,Wang, Shengqiang,Xu, Xiaobo,Yan, Leyu,Yang, A-Xiu

supporting information, p. 8691 - 8695 (2021/10/22)

A practical and mild method for the switchable synthesis of sulfoxides or sulfonesviaselective oxidation of sulfides using cheapN-fluorobenzenesulfonimide (NFSI) as the oxidant has been developed. These highly chemoselective transformations were simply achieved by varying the NFSI loading with H2O as the green solvent and oxygen source without any additives. The good functional group tolerance makes the strategy valuable.

Metal-free radical thiolations mediated by very weak bases

Koziakov, Denis,Majek, Michal,Jacobi Von Wangelin, Axel

supporting information, p. 11347 - 11352 (2016/12/16)

Aromatic thioethers and analogous heavier chalcogenides were prepared by reaction of arene-diazonium salts with disulfides in the presence of the cheap and weak base NaOAc. The mild and practical reaction conditions (equimolar reagents, DMSO, r.t., 8 h) tolerate various functional groups (e.g. Br, Cl, NO2, CO2R, OH, SCF3, furans). Mechanistic studies indicate the operation of a radical aromatic substitution mechanism via aryl, acetyloxyl, thiyl, and dimsyl radicals.

Application of silica vanadic acid as a heterogeneous, selective and highly reusable catalyst for oxidation of sulfides at room temperature

Zolfigol, Mohammad Ali,Khazaei, Ardeshir,Safaiee, Maliheh,Mokhlesi, Mohammad,Rostamian, Rahele,Bagheri, Mahsa,Shiri, Morteza,Kruger, Hendrik Gerhardus

, p. 80 - 86 (2013/05/08)

Silica vanadic acid (vanadium has been supported on silica) is applied as an efficient, highly reusable and heterogeneous catalyst for the selective oxidation of sulfide to sulfoxide using hydrogen peroxide and in the acetonitrile as a solvent at room temperature. The catalyst can be easily recovered and reused for ten reaction cycles without considerable loss of activity. Also, some advantages of this method were applicable at large scales, high TON of catalyst, chemoselectivity, easy work-up and short reaction time.

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