5434-63-9

Basic information

• Product Name: 9,10-dihydro-9,10-ethanoanthracene-11-carboxylic acid
• CAS NO: 5434-63-9
• Molecular Formula: C₁₇H₁₄O₂
• Molecular Weight: 250.2919
• Mol File: 5434-63-9.mol
• Article Data: 9

Chemical Properties

• Boiling Point: 443.9°C at 760 mmHg
• Flash Point: 200.9°C
• Density: 1.284g/cm³
• Vapor Pressure: 1.17E-08mmHg at 25°C
• Refractive Index: 1.658
• CAS DataBase Reference: 9,10-dihydro-9,10-ethanoanthracene-11-carboxylic acid(CAS DataBase Reference)
• NIST Chemistry Reference: 9,10-dihydro-9,10-ethanoanthracene-11-carboxylic acid(5434-63-9)
• EPA Substance Registry System: 9,10-dihydro-9,10-ethanoanthracene-11-carboxylic acid(5434-63-9)

Safety Data

• Hazardous Substances Data: 5434-63-9(Hazardous Substances Data)

Upstream product

• 120-12-7 anthracene 
• 79-10-7 acrylic acid 
• 86367-71-7 11-ethyl 9,10-dihydro-9,10-ethanoanthracene-11-carboxylate 
• 13387-47-8 9,10-di-tert-butyl-9,10-dihydroanthracene 
• 7673-68-9 dibenzobicyclo[2.2.2]octa-2,5-diene-7-carbaldehyde 
• 59353-09-2 11-chlorosulfonyl-9,10-dihydro-9,10-ethano-anthracene-11-carbonyl chloride 
• 13294-86-5 methyl 9,10-dihydro-9,10-ethanoanthracene-11-carboxylate 
• 107-02-8 acrolein 
• 598-78-7 (R,S)-2-chloropropionic acid 
• 107-94-8 chloropropionic acid 
• 590-92-1 3-Bromopropionic acid 

Downstream Products

• 58286-94-5 (9,10-dihydro-9,10-ethano-anthracen-11-yl)-carbamic acid ethyl ester 
• 6624-25-5 (9,10-dihydro-9,10-ethano-anthracen-11-yl)-methanol 
• 120-12-7 anthracene 
• 79-10-7 acrylic acid 
• 127897-32-9 C₂₉H₂₃N 
• 5675-64-9 <2,3:5,6>dibenzo<2.2.2>octa-2,5-diene 
• 4838-42-0 9,10,9',10'-tetrahydro-9,9'-biacridyl 
• 127897-33-0 C₂₉H₂₁N 
• 1521-59-1 9,10-dihydro-9,10-ethano-anthracen-11-ol 
• 127897-32-9 C₂₉H₂₃N 

Relevant articles and documents

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RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component (wherein Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4 , Ry1 , Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).