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57840-38-7

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57840-38-7 Usage

Description

Triphenylsulphonium hexafluoroantimonate(1-) is a chemical compound consisting of a trivalent cation, triphenylsulphonium, and a hexafluoroantimonate anion. It is known for its ability to facilitate various chemical reactions and processes, making it a valuable component in chemical research and industrial applications.

Uses

Used in Organic Synthesis:
Triphenylsulphonium hexafluoroantimonate(1-) is used as a phase-transfer catalyst in organic synthesis reactions. It aids in transferring reactants from one phase to another, which enhances the reaction process and leads to increased yields.
Used in Lithium Ion Batteries:
In the energy industry, triphenylsulphonium hexafluoroantimonate(1-) serves as an electrolyte in lithium-ion batteries. Its presence improves the performance and efficiency of these batteries, contributing to advancements in energy storage technology.
Used in Photochemical Reactions:
Triphenylsulphonium hexafluoroantimonate(1-) is also utilized as an additive in photochemical reactions. It plays a crucial role in enhancing the efficiency of these reactions, which has applications in various chemical research and industrial processes.

Check Digit Verification of cas no

The CAS Registry Mumber 57840-38-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,7,8,4 and 0 respectively; the second part has 2 digits, 3 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 57840-38:
(7*5)+(6*7)+(5*8)+(4*4)+(3*0)+(2*3)+(1*8)=147
147 % 10 = 7
So 57840-38-7 is a valid CAS Registry Number.
InChI:InChI=1/C18H15S.6FH.Sb/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;;;;;;;/h1-15H;6*1H;/q+1;;;;;;;+5/p-6/rC18H15S.F6Sb/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;1-7(2,3,4,5)6/h1-15H;/q+1;-1

57840-38-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name triphenylsulfonium hexafluoroantimonate

1.2 Other means of identification

Product number -
Other names TRIPHENYL SULFONIUM HEXAFLUOROANTIMONATE

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:57840-38-7 SDS

57840-38-7Synthetic route

sodium hexafluoroantimonate

sodium hexafluoroantimonate

1,1'-sulfinylbisbenzene
945-51-7

1,1'-sulfinylbisbenzene

benzene
71-43-2

benzene

triphenylsulfonium hexafluoroantimonate
57840-38-7

triphenylsulfonium hexafluoroantimonate

Conditions
ConditionsYield
Stage #1: 1,1'-sulfinylbisbenzene; benzene With aluminum (III) chloride for 23h; Heating / reflux;
Stage #2: With hydrogenchloride In water at 0℃;
Stage #3: sodium hexafluoroantimonate In water
triphenylsulfonium hexafluoroantimonate
57840-38-7

triphenylsulfonium hexafluoroantimonate

A

benzene-d1
1120-89-4

benzene-d1

B

diphenyl sulfide
139-66-2

diphenyl sulfide

Conditions
ConditionsYield
With [D3]acetonitrile; 9,10-diphenylanthracene Product distribution; Mechanism; Irradiation;

57840-38-7Relevant articles and documents

PHOTOINITIATORS HAVING TRIARYLSULFONIUM AND ARYLSULFINATE IONS

-

Page/Page column 40, (2010/02/11)

Compositions are provided that include a photoinitiator system for free radical polymerization reactions. More specifically, the photoinitiator includes an arylsulfinate ion and a triarylsulfonium ion. Polymerization methods are also provided those include the photoinitiator in a photopolymerizable composition. Additionally, triarylsulfonium arylsulfinate salts are disclosed.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

-

, (2008/06/13)

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

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