67373-13-1

Basic information

• Product Name: Benzoic acid, 2-(phenylthio)-, methyl ester
• CAS NO: 67373-13-1
• Molecular Formula: C14H12O2S
• Molecular Weight: 244.314
• Mol File: 67373-13-1.mol
• Article Data: 20

Chemical Properties

• CAS DataBase Reference: Benzoic acid, 2-(phenylthio)-, methyl ester(CAS DataBase Reference)
• NIST Chemistry Reference: Benzoic acid, 2-(phenylthio)-, methyl ester(67373-13-1)
• EPA Substance Registry System: Benzoic acid, 2-(phenylthio)-, methyl ester(67373-13-1)

Safety Data

• Hazardous Substances Data: 67373-13-1(Hazardous Substances Data)

Upstream product

• 108-86-1 bromobenzene 
• 4892-02-8 Methyl thiosalicylate 
• 102-52-3 malonaldehydebis(dimethylacetal) 
• 130416-64-7 [1-methoxy-3-(phenylsulfanyl)buta-1,3-dienyloxy]trimethylsilane 
• 873-55-2 sodium benzenesulfonate 
• 374538-03-1 2-methoxycarbonylphenylboronic acid 
• 108-90-7 chlorobenzene 
• 610-94-6 2-bromobenzoic acid methyl ester 
• 108-98-5 thiophenol 
• 591-50-4 iodobenzene 
• 67-56-1 methanol 
• 1527-12-4 2-(phenylthio)benzoic acid 
• 147-93-3 Thiosalicylic acid 
• 610-96-8 methyl chlorobenzoate 

Downstream Products

• 95803-45-5 diphenyl(2-(phenylthio)phenyl)methanol 

Relevant articles and documents

Chan-Lam-Type C-S Coupling Reaction by Sodium Aryl Sulfinates and Organoboron Compounds

A Chan-Lam-Type C-S coupling reaction using sodium aryl sulfinates has been developed to provide diaryl thioethers in up to 92% yields in the presence of a copper catalyst and potassium sulfite. Both electron-rich and electron-poor sodium aryl sulfinates and diverse organoboron compounds were tolerated for the synthesis of aryl and heteroaryl thioethers and dithioethers. The mechanistic study suggested that potassium sulfite was involved in the deoxygenation of sulfinate through a radical process.

Dechalcogenization of Aryl Dichalcogenides to Synthesize Aryl Chalcogenides via Copper Catalysis

An application for dechalcogenization of aryl dichalcogenides via copper catalysis to synthesize aryl chalcogenides is disclosed. This approach is highlighted by the practical conditions, broad substrate scope, and good functional group tolerance with several sensitive groups such as aldehyde, ketone, ester, amide, cyanide, alkene, nitro, and methylsulfonyl. Furthermore, the robustness of this methodology is depicted by the late-stage modification of estrone and synthesis of vortioxetine. Remarkably, synthesis of more challenging organic materials with large ring tension under milder conditions and synthesis of some halogen contained diaryl sulfides which could not be synthesized using metal-catalyzed coupling reactions of aryl halogen are successfully accomplished with this protocol.

Positive resist composition, resist pattern forming process, and photomask blank

A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.