945548-25-4Relevant articles and documents
Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof
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Page/Page column 13, (2016/10/17)
The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.
Scope and regioselectivity of iridium-catalyzed C-H borylation of aromatic main-chain polymers
Chang, Ying,Lee, Hanniel H.,Kim, Se Hye,Jo, Tae Soo,Bae, Chulsung
, p. 1754 - 1764 (2013/04/24)
An efficient functionalization of aromatic main-chain polymers was established using a combination of iridium-catalyzed borylation of aromatic C-H bonds and the Suzuki-Miyaura coupling reaction. Comparative studies of various iridium catalysts and borylation reagents show that [Ir(OMe)(COD)]2 is significantly more active than [IrCl(COD)]2, and bis(pinacolato)diboron induces higher efficiency than pinacolborane. The regioselectivity of the borylation was investigated using model compounds that mimic the repeating unit structure of poly(arylene ether sulfone). The C-H bonds of the sulfone model compound were more reactive than those of the bisphenol model compound, and the borylation occurred preferentially at the meta position to the sulfone moiety owing to steric hindrance and electronic effects. The glass transition temperature of the borylated polymer increases with increasing concentration of pinacolboronic ester group. The pinacolboronic ester group could be conveniently converted to boronic acid [B(OH)2] and potassium trifluoroborate (BF3K), which could also serve as versatile reactive sites for the synthesis of a wide range of functionalized polymers via Suzuki-Miyaura couplings.