99186-26-2Relevant articles and documents
COMPOUND AND COMPOSITION CONTAINING THE SAME, AND METHOD FOR MANUFACTURING DEVICE USING THE COMPOSITION
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Paragraph 0104-0106, (2017/09/14)
PROBLEM TO BE SOLVED: To provide a compound which efficiently absorbs extreme ultraviolet radiation (EUV) such as KrF excimer laser and ArF excimer laser or an electron beam, has low sensitivity to OoB, and has high contrast. SOLUTION: A compound is represented by formula (1) and formula (2). In formulae (1) and (2), R1a and R1a are each independently a first monovalent organic group containing a divalent hydrocarbon group selected from an alkylene group; a group bonded directly to sulfur atom (S+) is the divalent hydrocarbon group; R2 is a hydrogen atom, an alkyl group and the like; R3 to R6 are a hydrogen atom, a hydroxy group or a second monovalent organic group; X- is a monovalent anion; and R1a and R1b in Formula (1) or R1a and R1b in Formula (2) may be bonded to each other to form a ring. SELECTED DRAWING: None COPYRIGHT: (C)2017,JPOandINPIT