- Electron irradiation of solid nitrous oxide
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We report the results of chemical processing induced by 1 keV electron irradiation of a solid N2O ice sample formed at 25 K. Ozone and several oxides of nitrogen (NO2, N2O2, N2O3, N2O4 and N2O5) were observed to form during the irradiation period. Such reactions have important implications for the ice chemistry of outer solar system planets/satellites and interstellar ices.
- Sivaraman,Ptasinska,Jheeta,Mason
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p. 108 - 111
(2009/02/04)
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- Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures
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The role of intermediate species generated during wet chemical etching of silicon in a HF-rich HF/HNO3 mixture was studied by spectroscopic and analytical methods at 1°C. The intermediate N2O3 was identified by its cobalt blue color and the characteristic features in its UV-vis and Raman spectra. Furthermore, a complex N(III) species (3NO +·NO3-) denoted as [N4O 62+] is observed in these solutions. The time-dependent decay of the N(III) intermediates, mainly by their oxidation at the liquid-air interface, serves as a precondition for the study of the etch rate as function of the intermediate concentration measured by Raman spectroscopy. From a linear relationship between etch rate and [N4O62+] concentration, NO+ is considered to be a reactive species in the rate-limiting step. This step is attributed to the oxidation of permanent existing Si-H bonds at the silicon surface by the reactive NO+ species. N2O3 serves as a reservoir for the generation of NO+ leading to a complete coverage of the silicon surface with reactive species at high intermediate concentrations. As long as this condition is valid (plateau region), the etch rate is constant and yields a smooth silicon surface upon completion of the etching. If the N2O3 concentration is insufficient to ensure a coverage of the Si surface by NO +, the etch rate decreases linearly with the N2O 3 concentration and results in a roughening of the etched silicon surface (slope region).
- Steinert, Marco,Acker, Joerg,Krause, Matthias,Oswald, Steifen,Wetzig, Klaus
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p. 11377 - 11382
(2008/10/09)
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- Low temperature NO disproportionation by Mn porphyrin. Spectroscopic characterization of the unstable nitrosyl nitrito complex MnIII(TPP) (NO)(ONO)
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Reaction of NO gas with sublimed layers of the MnIITPP (TPP = meso-tetraphenylporphyrinato2-) at low temperature leads to nitric oxide disproportionation. UV-Vis and FTIR spectroscopy with isotopically substituted nitrogen oxides rev
- Martirosyan, Garik G.,Azizyan, Arsen S.,Kurtikyan, Tigran S.,Ford, Peter C.
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p. 1488 - 1489
(2007/10/03)
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- Adsorption and photoexcitation of NO on Ag/Pt(1 1 1)
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The adsorption and photoreaction of NO on Ag films deposited on Pt(1 1 1) were investigated at 90 K by reflection-absorption infrared spectroscopy (RAIRS). Similar to Ag(1 1 1), NO molecules were found to be converted into (NO)2 and N2O on the Ag films. At an Ag thickness of 1 ML, however, a new adsorption state that reveals a RAIRS band at 1848 cm-1 is present on the surface. The (NO)2 dimer species was found to react into N2O, while the reaction of the new species was substantially suppressed. Upon photon irradiation with a wavelength of 193 nm, the three adsorption species on Ag(1 ML)/Pt(1 1 1) were depleted from the surface. The origin of the newly found species and the photoreaction mechanism are discussed.
- Itoyama,Wilde,Matsumoto,Okano,Fukutani
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- Stabilization of the Primary Products of O(1D) Reactions with CO, CO2, CH4, and Other Hydrocarbons in Cryogenic Matrices
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Broad-band UV-visible irradiation of argon matrices containing 2percent N2O and 10percent of either CO, CO2, methane or ethane resulted in the formation of CO2, CO3, CH3OH, or CH3CH2OH as the dominant photoproducts of O(1D) reactions, as observed by FTIR
- Parnis, J. Mark,Hoover, Larry E.,Fridgen, Travis D.,Lafleur, Rick D.
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p. 10708 - 10711
(2007/10/02)
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- Reaction between Hydrocyanic Acid and O(1D2) or O(3P) Oxygen Atoms in Low-Temperature Matrices
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The reactions of hydrocyanic acid with both excited and ground-state oxygen atoms have been examined in low-temperature matrices.The major products of HCN + O(1D2) reaction were isocyanic acid (HNCO) and cyanic acid (HOCN), confirming predictions of the intermediacy of HNCO and oxazirine on the pathway to the final products seen in the gas-phase reaction.In contrast, no evidence was found for reaction between HCN and O(3P) atoms in the matrix.
- Crowley, John N.,Sodeau, John R.
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p. 3100 - 3103
(2007/10/02)
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- Infrared spectra and UHF SCF calculations of HF complexes with NO, (NO)2, and NO2
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HF complexes with nitric oxide and nitrogen dioxide were prepared in argon matrices and studied using IR spectroscopy and unrestricted Hartree-Fock SCF calculations.The results indicate the formation of three different complexes NO--HF, ONNO--HF, and ONO--HF, in which the hydrogen atom of HF is bound to an oxygen atom of the base in each complex.Perturbations in the N-O stretching base submolecule modes were observed in each complex and all were blue shifted with respect to the free base.From the calculations, the unpaired electron was found to be contained in a ? antibonding orbital which is in the plane of the NO- HF and ONO-HF complexes.
- Davis, Steven R.,Andrews, Lester,Trindle, Carl O.
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p. 6027 - 6033
(2007/10/02)
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- A Matrix-Isolation-Infrared Spectroscopic Study of the Reactions of Nitric Oxide with Oxygen and Ozone
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The oxidation of nitric oxide to NO2 has been studied by trapping the products of the gas-phase reactions of nitric oxide with excess oxygen and ozone in argon matrices at 10 K.The subsequent transitient species were identified and characterized by their infrared spectra.The primary products of the NO + O2 reactions were NO2, N2O3(A), N2O3(B), N2O4, and peroxy nitrate (OONO).The primary products of the NO + O3 reactions were NO2 and peroxy NO3 with the higher nitric oxides (N2O3, N2O4) formed in low concentrations relative to the NO + O2 reactions.Isotopic oxygen and ozone were employed to identify the infrared absorption frequency of peroxy nitrate.On the basis of our observations, reaction mechanisms are proposed for the oxidation of NO to NO2.
- Bhatia, Subhash C.,Hall, John H.
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p. 3255 - 3259
(2007/10/02)
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