Octamethylsilsesquioxane

Base Information

• Chemical Name: Octamethylsilsesquioxane
• CAS No.: 17865-85-9
• Deprecated CAS: 400003-06-7,57348-79-5,57348-79-5
• Molecular Formula: C8H24O12Si8
• Molecular Weight: 536.955
• Hs Code.: 29349990
• DSSTox Substance ID: DTXSID20893395
• Nikkaji Number: J789.549F
• Wikidata: Q72497376
• Mol file: 17865-85-9.mol

Synonyms:Octamethylsilsesquioxane;17865-85-9;Permethyloctasilsesquioxane;Octamethyl-POSS;PSS-Octamethyl substituted;Pentacyclo[9.5.1.13,9.15,15.17,13]octasiloxane, 1,3,5,7,9,11,13,15-octamethyl-;1,3,5,7,9,11,13,15-octamethyl-2,4,6,8,10,12,14,16,17,18,19,20-dodecaoxa-1,3,5,7,9,11,13,15-octasilapentacyclo[9.5.1.13,9.15,15.17,13]icosane;Pentacyclo[9.5.1.1(3,9).1(5,15).1(7,13)]octasiloxane, octamethyl-;Pentacyclo(9.5.1.13,9.15,15.17,13)octasiloxane, 1,3,5,7,9,11,13,15-octamethyl-;Ctamethyl-Poss;Ctamethylsilsesquioxane;Permethylctasilsesquioxane;Pss-Ctamethyl Substituted;Octa(methylsilsesquioxane);Octamethylsilsesquioxane POSS;Octasilsesquioxane, octamethyl-;SCHEMBL2618631;DTXSID20893395;AMY42262;MFCD02683561;AKOS015908968;BS-21846;I10272;Octamethyl-pentacyclo-[9.5.1.13,9.15,15.17,13 ]-octasiloxane;2,4,6,8,10,12,14,16,17,18,19,20-Dodecaoxa-1,3,5,7,9,11,13,15-octasilapentacyclo[9.5.1.13,9.15,15.17,13]eicosane, 1,3,5,7,9,11,13,15-octamethyl-

Chemical Property of Octamethylsilsesquioxane

Chemical Property:

• Melting Point: >350 °C(lit.)
• Boiling Point: 235 °C at 760 mmHg
• Flash Point: 97.6 °C
• PSA: 110.76000
• Density: 1.26g/cm³
• LogP: 0.80320
• Storage Temp.: Inert atmosphere,Room Temperature
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 12
• Rotatable Bond Count: 0
• Exact Mass: 535.94218847
• Heavy Atom Count: 28
• Complexity: 456

Purity/Quality:

98%,99%, ^*data from raw suppliers

PSS-Octamethyl substituted ^*data from reagent suppliers

Safty Information:

• Pictogram(s):  
• Hazard Codes: 

MSDS Files:

SDS file from LookChem

Useful:

• Canonical SMILES: C[Si]12O[Si]3(O[Si]4(O[Si](O1)(O[Si]5(O[Si](O2)(O[Si](O3)(O[Si](O4)(O5)C)C)C)C)C)C)C

Technology Process of Octamethylsilsesquioxane

There total 15 articles about Octamethylsilsesquioxane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 88.0%

Methyltriethoxysilan (2031-67-6) → octamethylsilsesquioxane (17865-85-9)

Guidance literature:

With hydrogenchloride; water; triethylamine; In formic acid; acetone; acetonitrile; at 20 ℃; for 48h; Reflux;

DOI:10.1039/c5tc02683k

Reference yield: 76.0%

Methyltrimethoxysilan (1185-55-3) → octamethylsilsesquioxane (17865-85-9)

Guidance literature:

Methyltrimethoxysilan; With water; potassium hydroxide; In diethylene glycol dimethyl ether; at 20 ℃; for 2h;

In diethylene glycol dimethyl ether; for 0.05h; Microwave irradiation;

DOI:10.1246/cl.2010.354

Reference yield: 68.0%

2,4,6,8-tetramethylcyclotetrasiloxane (2370-88-9) → octamethylsilsesquioxane (17865-85-9)

Guidance literature:

With sodium hydroxide; In diethyl ether; at 0 - 5 ℃;

DOI:10.1016/S0022-328X(00)98706-0

upstream raw materials:

Methyltrichlorosilane

Methyltriethoxysilan

tributoxy-methyl-silane

trichlorovinylsilane

Refernces

• 1、 Martynova, T. N.,Korchkov, V. P.. "DEHYDROCONDENSATION OF HYDROGEN-CONTAINING CYCLOSILOXANES". . p. 241 - 250. Retrieved 1983.
• 2、 Rebrov, E. A.,Tebeneva, N. A.,Mouzafarov, A. M.,Ovchinnikov, Yu. E.,Struchkov, Yu. T.,Strelkova, T. V.. "Problems of synthesis of tetrahedral organosilsesquioxanes. Hydrolytic condensation of hexafunctional branched organotetrasiloxanes". . p. 1286 - 1292. Retrieved 1995.
• 3、 Lee, Albert S.,Choi, Seung-Sock,Oh, Sung Yeoun,Lee, He Seung,Kim, Bomin,Hwang, Seung Sang,Baek, Kyung-Youl. "Incompletely condensed POSS-based spin-on-glass networks for impeccable ultra low-k integration". . p. 11605 - 11611. Retrieved 2015.
• 4、 Luo, Qun,Tang, Daihua,Li, Xiaodong,Wang, Qi,Wang, Zhipeng,Zhen, Zhen,Liu, Xinhou. "Preparation of polysilsesquioxane (CH3SiO1.5) 8 crystals from swollen PHEMA". . p. 278 - 279. Retrieved 2006.
• 5、 Zhang, Dian,Shi, Yunhui,Liu, Yufeng,Huang, Guangsu. "Influences of polyhedral oligomeric silsesquioxanes (POSSs) containing different functional groups on crystallization and melting behaviors of POSS/polydimethylsiloxane rubber composites". . p. 41364 - 41370. Retrieved 2015/05/20.