108-65-6Relevant articles and documents
Pattern-forming method, and radiation-sensitive composition
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, (2016/06/01)
A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A? represents —N?—SO2—RD, —COO?, —O? or —SO3?. —SO3? does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation. [in-line-formulae]-A? X+??(1)[/in-line-formulae]
A process for the preparation of acetate
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Paragraph 0061; 0062; 0063; 0064, (2017/01/26)
The invention relates to an acetate preparation method. The method comprises the following steps: carrying out a contact reaction of sec-butyl acetate and alcohol in the presence of an ester exchange catalyst under an ester exchange reaction condition, adding products obtained after the contact reaction into a separation tower, controlling the tower top temperature to separate unreacted sec-butyl acetate and sec-butyl alcohol generated after the reaction from the tower top, and carrying out normal-pressure or reduced-pressure flash evaporation to separate acetate generated after the reaction from a tower bottom fraction, wherein the alcohol is alcohol having a general formula of R(OH)n and/or polyol alkylether having at least one hydroxy group, R is a C5-C20 n-valence alkyl group, a C5-C20 n-valence alkenyl group, a C5-C12 n-valence cycloalkyl group or a C7-C20 n-valence aryl group, and n is an integer in a range of 1-5. The method has the advantages of high conversion rate of the alcohol as a reaction raw material, and high acetate selectivity.
Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same
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, (2015/11/16)
Provided are an actinic-ray-sensitive or a radiation-sensitive resin composition with greater residual film ratio and capable of suppressing pattern collapse and an occurrence of bridge defects after development, and a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the same. An actinic-ray-sensitive or radiation-sensitive resin composition includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) represented by any of following General Formulae (B-1) to (B-3), and a solvent, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and R1, R2 and R3 each independently represent a straight chain or branched alkyl group.