16669-54-8

Basic information

• Product Name: 2,2',2''-Nitrilotriacetic acid triethyl ester
• Synonyms: 2,2',2''-Nitrilotriacetic acid triethyl ester;N,N-Bis(2-ethoxy-2-oxoethyl)glycine ethyl ester;Nitrilotriacetic acid triethyl ester;Glycine, N,N-bis(2-ethoxy-2-oxoethyl)-, ethyl ester
• CAS NO: 16669-54-8
• Molecular Formula: C₁₂H₂₁NO₆
• Molecular Weight: 275.3
• Mol File: 16669-54-8.mol
• Article Data: 12

Chemical Properties

• Boiling Point: 184 °C(Press: 17 Torr)
• Appearance: /
• Density: 1.1182 g/cm3(Temp: 9.5 °C)
• Storage Temp.: Sealed in dry,Room Temperature
• PKA: 2.62±0.50(Predicted)
• CAS DataBase Reference: 2,2',2''-Nitrilotriacetic acid triethyl ester(CAS DataBase Reference)
• NIST Chemistry Reference: 2,2',2''-Nitrilotriacetic acid triethyl ester(16669-54-8)
• EPA Substance Registry System: 2,2',2''-Nitrilotriacetic acid triethyl ester(16669-54-8)

Safety Data

• Hazardous Substances Data: 16669-54-8(Hazardous Substances Data)

Usage

Triethyl ester of nitrilotriacetic acid

It is derived from nitrilotriacetic acid, a polyamino carboxylic acid, by attaching an ethyl ester group to each of the three carboxyl groups.

Chelating agent

2,2',2''-Nitrilotriacetic acid triethyl ester is used to bind and remove metal ions from solutions, forming stable, soluble complexes with multivalent metal cations.

Applications in pharmaceutical and chemical industries

The compound is commonly employed in these industries for its chelating properties, which help in various processes such as synthesis, purification, and analysis.

Use in cleaning agents and detergents

The chelating ability of 2,2',2''-Nitrilotriacetic acid triethyl ester helps to remove metal ions that may interfere with the cleaning process, enhancing the effectiveness of these products.

Metal surface treatment

The compound can be used to treat metal surfaces by removing metal ions and preventing corrosion, scaling, and other unwanted effects.

Environmental remediation and water treatment

Due to its ability to sequester heavy metals, 2,2',2''-Nitrilotriacetic acid triethyl ester has potential applications in cleaning up contaminated water sources and soil.

Toxicity and environmental impact

It is important to handle this compound with care, as it can be toxic and harmful to aquatic organisms, potentially causing negative effects on ecosystems and water quality.

Upstream product

• 139-13-9 nitrilotriacetic acid 
• 64-17-5 ethanol 
• 623-73-4 diazoacetic acid ethyl ester 
• 75-03-6 ethyl iodide 

Downstream Products

• 4862-18-4 nitrilotriacetic acid triamide 

Relevant articles and documents

Synthesis of new macrobicyclic hexaamide ligands

A new two-step synthesis method of macrobicyclic hexaamide ligands LH6 (I and II) with double condensation of triethyl nitrilotriacetate and 1,4(1,2)-diaminobenzene was developed. The cyclization does not require high dilution and template techniques. Two new hexaamide ligands were prepared in good yields according to the proposed method.

Connector ability to design superhydrophobic and oleophobic surfaces from conducting polymers

In the aim of creating superoleophobic surfaces using monomers with short perfluorinated chains, to avoid drawbacks associated with PFOA, original semifluorinated (C4F9, C6F13) 3,4-ethylenedioxypyrrole derivatives were synthesized. These monomers were obtained using the faster synthetic method than previously described with some analogues, characterized and electrochemically polymerized on gold plates. The obtained surfaces exhibited superhydrophobic (contact angle with water of 157° and 158°, respectively) and oleophobic properties (contact angle with hexadecane: 88° and 108°, respectively). The comparison between these new monomers and already published analogue EDOP6 confirms the importance of the bipolaronic form of conductive polymer for obtaining surface nanoporosity and as a consequence improving surface oleophobicity. Thus, little change in the molecule design of the connector and the spacer of the monomer can have a significant influence on the surface oleophobicity.

Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film

A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0 (c+d)/(a+b+c+d) ≤ 1.0, and X and Y are each the formula (2) or (3), provided that at least one group of the formula (3) is present, (B) a photoacid generator represented by the formula (8) and (C) a solvent.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.