3275-24-9

Basic information

• Product Name: TETRAKIS(DIMETHYLAMINO)TITANIUM
• Synonyms: TDMAT;TITANIUM TETRAKIS(DIMETHYLAMIDE);TITANIUM(IV) DIMETHYLAMIDE;TETRAKIS(DIMETHYLAMINO)TITANIUM;TETRAKIS(DIMETHYLAMINO)TITANIUM(IV);TETRAKIS (DIMETHYLAMIDO) TITANIUM;TETRAKIS(DIMETHYLAMIDO)TITANIUM(IV);Methanamine, N-methyl-, titanium(4+) salt
• CAS NO: 3275-24-9
• Molecular Formula: 4C₂H₆N*Ti
• Molecular Weight: 224.17
• EINECS: 221-904-3
• Product Categories: Classes of Metal Compounds;Ti (Titanium) Compounds;Transition Metal Compounds;metal amide complex;ALD Precursors
• Mol File: 3275-24-9.mol
• Article Data: 2

Chemical Properties

• Melting Point: <4°C
• Boiling Point: 50 °C0.5 mm Hg(lit.)
• Flash Point: -22 °F
• Appearance: yellow to orange/liquid
• Density: 0.947 g/mL at 25 °C(lit.)
• Refractive Index: 1.55
• Storage Temp.: Flammables area
• Sensitive: Moisture Sensitive
• CAS DataBase Reference: TETRAKIS(DIMETHYLAMINO)TITANIUM(CAS DataBase Reference)
• NIST Chemistry Reference: TETRAKIS(DIMETHYLAMINO)TITANIUM(3275-24-9)
• EPA Substance Registry System: TETRAKIS(DIMETHYLAMINO)TITANIUM(3275-24-9)

Safety Data

• Hazard Codes: F,C,Xi
• Statements: 11-14-34
• Safety Statements: 16-26-36/37/39-43-45
• RIDADR: UN 3398 4.3/PG 1
• WGK Germany: 3
• TSCA: Yes
• HazardClass: 4.3
• PackingGroup: II
• Hazardous Substances Data: 3275-24-9(Hazardous Substances Data)

Usage

Description

TETRAKIS(DIMETHYLAMINO)TITANIUM, also known as Tetrakis(dimethylamido)titanium(IV) (TDMAT), is a chemical compound with the atomic number 22, which is derived from the base material Titanium. It is characterized by its clear yellow to orange liquid appearance and possesses unique chemical properties that make it suitable for various applications.

Uses

Used in Electronics Industry:
TETRAKIS(DIMETHYLAMINO)TITANIUM is used as a precursor for titanium nitride (TiN) thin films by organometallic chemical vapor deposition (OMCVD) and titanium dioxide thin films by atomic layer deposition (ALD). The application reason is to provide a stable and efficient method for depositing thin films with desired properties, such as improved electrical conductivity, corrosion resistance, and optical properties.
Used in Chemical Vapor Deposition Systems:
TETRAKIS(DIMETHYLAMINO)TITANIUM is used as a precursor in chemical vapor deposition systems for the formation of titanium nitride and titanium dioxide thin films. The application reason is to facilitate the growth of high-quality thin films with controlled thickness and uniformity, which are essential for various electronic and optoelectronic devices.
Used in Research and Development:
TETRAKIS(DIMETHYLAMINO)TITANIUM is used as a research compound for studying the properties and applications of titanium-based materials. The application reason is to gain a deeper understanding of the chemical behavior and potential uses of titanium compounds in various fields, such as materials science, electronics, and nanotechnology.

InChI:InChI=1/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4/rC8H24N4Ti/c1-9(2)13(10(3)4,11(5)6)12(7)8/h1-8H3

Upstream product

• 189336-60-5 Ti(η(5):σ(1)-C5H4(CH2)3NCMe3)(NMe2)2 
• 7732-18-5 water 
• 3585-33-9 lithium dimethylamide 

Downstream Products

• 25092-88-0 N¹,N²,N³-trimethylbenzamidine 
• 23314-06-9 N,N-dimethyl-N'-tert-butylformamidine 
• 16487-48-2 3-Phenyl-propenyliden-bis-(dimethylamin), 1,1-Bis--3-phenyl-propen-(1') 
• 3768-60-3 N,N,N',N'-tetramethylsulfurous acid diamine 
• 5762-56-1 tris(dimethylamino)methane 
• 29922-07-4 1,4-Bis(dimethylamino)-1,4-diphenylbutadien 
• 2404-03-7 diethyl N,N-dimethylphosphoramide 
• 3853-06-3 methyl 3-(dimethylamino)propionate 
• 17268-47-2 3-(N,N-dimethylamino)-N',N'-dimethylpropionamide 
• 183559-62-8 Mo(≡N)(NMe₂)₃ 
• 3087-39-6 titanium(IV) tert-butoxide 
• 1401033-12-2 (N-((6-(1H-pyrrol-2-yl)pyridin-2-yl)methyl)-2,6-diisopropylbenzeneamine^(2-))Ti(IV)(dimethylamido)₂ 
• 1356841-59-2 [TiCl₂(NH(CH₃)2)2(NC₆H₄C(CH₃)2C₂H₄C₅H₄N)] 
• 1356841-53-6 [TiCl₂(NH(CH₃)2)2(NC₆H₄C(CH₂)CH₂C₆H₅)] 

Relevant articles and documents

Synthesis and Characterization of Group 4 Amido Silyl Complexes Free of Anionic π-Ligands

A series of early-transition-metal silyl complexes free of anionic π-ligands such as cyclopentadienyl (Cp = η5-C5H5) have been synthesized. These Cp-free complexes (Me2N)3MSi(SiMe3)3 [M = Zr (1), Hf (2)], (Me2N)3TiSiPh2But (3), (Me2N)3ZrSiPh2But·0.5THF (4), (Me2N)3HfSiPh2But·nTHF [n = 0.5 (5a), 1 (5b)], and (Me2N)2[(Me3Si)2N]ZrSiR3 [SiR3 = Si(SiMe3)3 (7), SiPh2But (8)] were prepared by metathetic reactions of chloro triamido complexes (Me2N)3MCl (M = Ti, Zr, Hf) or (Me2N)2[(Me3Si)2N]ZrCl (6) with silyllithium reagents Li(THF)3Si(SiMe3)3 or Li(THF)3SiPh2But. The structures of 1, 3, 4, 5b, and 8 have been determined by X-ray crystallography and show that 1, 3, and 8 adopt a distorted tetrahedral coordination geometry while 4 and 5b have a distorted trigonal bipyramidal geometry around the metal. The unit cell parameters are as follows. 1: space group R3c, a = 15.505(2) A?, c = 19.308(4) A?, V = 4019.9(13) A?3, Z = 6. 3: space group P21, a = 8.633(5) A?, b = 14.790(7) A?, c = 9.388(4) A?, β = 92.44(4)°, V = 1197.6(10) A?3, Z = 2. 4: space group Pbca, a = 16.538(9) A?, b = 17.282(7) A?, c = 18.566(8) A?, V = 5306(4) A?3, Z = 8. 5b: space group Pna21, a = 17.463(6) A?, b = 9.453(3) A?, c = 17.800(6) A?, V = 2938(2) A?3, Z = 4. 8: space group Pca21, a = 19.775(5) A?, b = 10.182(2) A?, c = 15.752(5) A?, V = 3172(2) A?3, Z = 4. The M-Si bond distances for 1, 3, 4, 5b, and 8 are 2.781(2), 2.635(2), 2.803(2), 2.807(4), and 2.860(2) A?, respectively. The Zr-Si bond in 8, to our knowledge, is the longest reported Zr-Si bond.