34844-48-9

Basic information

• Product Name: 1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol
• Synonyms: 1,1,1-Trifluoro-2-(trifluoromethyl)-2,4-pentanediol;1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol;1,1-Bis(trifluoromethyl)butane-1,3-diol
• CAS NO: 34844-48-9
• Molecular Formula: C₆H₈F₆O₂
• Molecular Weight: 226.1169392
• Mol File: 34844-48-9.mol
• Article Data: 9

Chemical Properties

• Boiling Point: 191℃
• Flash Point: 69℃
• Appearance: /
• Density: 1.451
• Refractive Index: 1.534
• PKA: 9.55±0.29(Predicted)
• CAS DataBase Reference: 1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol(CAS DataBase Reference)
• NIST Chemistry Reference: 1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol(34844-48-9)
• EPA Substance Registry System: 1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol(34844-48-9)

Safety Data

• Hazardous Substances Data: 34844-48-9(Hazardous Substances Data)

Usage

General Description

1,1,1-Trifluoro-2-trifluoromethylpentane-2,4-diol is a synthetic chemical compound with the molecular formula C8H12F6O2. It is a clear, colorless liquid with a faint odor and is highly stable and non-reactive. This chemical is commonly used as a solvent or as a building block for the synthesis of other chemicals. It has excellent solvency power and is often used in the production of pharmaceuticals, agrochemicals, and specialty chemicals. It is also used in the manufacturing of surfactants and in various industrial applications where a fluorinated solvent is required. Additionally, it is important to handle and store this chemical with care as it can be harmful if ingested, inhaled, or comes into contact with skin or eyes.

InChI:InChI=1/C12H14FNO/c13-11-10(6-7-14-12(11)15)8-9-4-2-1-3-5-9/h1-5,10-11H,6-8H2,(H,14,15)

Upstream product

• 928822-65-5 C₆H₄F₆O₂ 
• 646-97-9 1,1,1-trifluoro-2-(trifluoromethyl)pent-4-en-2-ol 
• 10487-10-2 5,5,5-trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-one 
• 75-07-0 acetaldehyde 
• 503169-76-4 1,1-bis(trifluoromethyl)-2-bromoethanol 

Downstream Products

• 630414-85-6 5,5,5-trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl methacrylate 
• 1171191-33-5 5,5,5-trifluoro-4-hydroxy-4-(trifluoromethyl)pentan-2-yl 2-fluoroacrylate 
• 1072152-65-8 C₁₄H₁₃F₁₁O₃ 

Relevant articles and documents

Facile preparation and synthetic applications of LiCH2C(CF3)2Oli

Bromohydrin BrCH2C(CF3)2OH readily reacts with two equivalents of n-BuLi at - 78 °C to produce the corresponding dilithium derivative LiCH2C(CF3)2OLi in high yield. This dilithiated derivative reacts selectively, acting as a C-nucleophile, with a variety of electrophiles such as R2PCl, carbonyl compounds, and epoxides, to give electron-deficient phosphines R2PCH2C(CF3)2OH, 1,3- and 1,4-diols, correspondingly.

1,1-Bis(trifluoromethyl)butadiene-1,3-A new fluorinated building block

Although 1,1-bis(trifluoromethyl)butadiene-1,3 (1) reacts with dimethylamine with selective formation of 1,4-adduct [trans-(CF3)2CHCH{double bond, long}CHCH2N(CH3)2], halogenation of 1 proceeds with predominant formation (>92%) of 1,2-adducts (CF3)2C{double bond, long}CHCHXCH2X (X = Cl or Br). Electrophilic conjugated addition of "ClF" or "BrF" to 1 proceeds exclusively with the formation of 1,2-adducts (CF3)2C{double bond, long}CHCHFCH2X (major) and (CF3)2C{double bond, long}CHCHXCH2F (X = Cl or Br). Difluorocarbene adds selectively to {single bond}CH{double bond, long}CH2 moiety of 1 forming thermally stable vinylcyclopropane. In Diels-Alder reaction with linear or cyclic dienes (butadienes, cyclopentadiene, cyclohexadiene-1,3) and quadricyclane compound 1 behaves as dienophile providing for the reaction electron-deficient {single bond}CH{double bond, long}CH2 bond. The relative rate of cycloaddition of 1 and other fluoroolefins to quadricyclane, measured by high temperature NMR, indicates that (CF3)2C{double bond, long}CH{single bond} acts as very strong electron-withdrawing substituent. Synthetic utility of products based on 1 was also demonstrated.

Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions

Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4 are as defined herein. Also provided are copolymers prepared by radical polymerization of (I) and a second monomer that may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.