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3768-57-8

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3768-57-8 Usage

General Description

TRIS(DIMETHYLAMINO)METHYLSILANE is a chemical compound with the molecular formula C9H27N3Si. It is a colorless liquid with a pungent odor and is used as a silane coupling agent in various industrial applications. This chemical is highly reactive and is commonly used in the production of adhesives, sealants, and coatings. TRIS(DIMETHYLAMINO)METHYLSILANE is also utilized as a precursor in the synthesis of silicon-based polymers and as a catalyst in the formation of silicon-organic compounds. Additionally, it is known for its ability to improve the adhesion and durability of materials by promoting strong molecular bonds between different surfaces. Due to its reactivity and potential hazards, it must be handled and stored with great care in a controlled environment.

Check Digit Verification of cas no

The CAS Registry Mumber 3768-57-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,7,6 and 8 respectively; the second part has 2 digits, 5 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 3768-57:
(6*3)+(5*7)+(4*6)+(3*8)+(2*5)+(1*7)=118
118 % 10 = 8
So 3768-57-8 is a valid CAS Registry Number.
InChI:InChI=1/C7H21N3Si/c1-8(2)7(11,9(3)4)10(5)6/h1-6,11H3

3768-57-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name TRIS(DIMETHYLAMINO)METHYLSILANE

1.2 Other means of identification

Product number -
Other names Heptamethyl-silantriyltriamin

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:3768-57-8 SDS

3768-57-8Downstream Products

3768-57-8Relevant articles and documents

SILICON PRECURSOR AND METHOD OF MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

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Paragraph 0069-0074, (2021/09/10)

The present invention relates to a vapor deposition compound capable of thin film deposition through vapor deposition, and particularly to a silicon precursor capable of being applied to ALD or CVD, and specifically, enabling high temperature deposition, and a method of manufacturing a silicon-containing thin film.

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