53358-54-6 Usage
Description
Benzenamine, 4-bromo-N,N-dibutyl-, also known as 4-bromo-N,N-dibutylaniline, is a chemical compound with the molecular formula C16H23BrN. It is a brominated aromatic amine derivative of aniline, which is commonly used in the production of dyes, pharmaceuticals, and rubber chemicals. Benzenamine, 4-bromo-N,N-dibutylhas the potential to be a skin and eye irritant and may pose environmental and human health risks if not handled and disposed of properly.
Uses
Used in Organic Synthesis:
Benzenamine, 4-bromo-N,N-dibutylis used as an intermediate in organic synthesis for the production of various chemical compounds. Its unique structure allows it to be a versatile building block in the synthesis of a wide range of organic molecules.
Used in Chemical Research:
This brominated aromatic amine is also utilized in chemical research to study the properties and reactions of brominated compounds. It can provide valuable insights into the behavior of similar compounds and contribute to the development of new synthetic methods and applications.
Used in Pharmaceutical Industry:
Although not explicitly mentioned in the provided materials, benzenamine, 4-bromo-N,N-dibutyl-, may have potential applications in the pharmaceutical industry as a precursor for the synthesis of active pharmaceutical ingredients or as a building block for the development of new drugs.
Used in Dye Production:
As a derivative of aniline, benzenamine, 4-bromo-N,N-dibutyl-, can be used in the production of dyes. Its unique properties may contribute to the development of new dyes with specific color characteristics or improved performance.
Used in Rubber Chemicals:
Benzenamine, 4-bromo-N,N-dibutyl-, can also be used in the production of rubber chemicals, where it may serve as a key component in the synthesis of additives or other compounds that enhance the properties of rubber materials.
Check Digit Verification of cas no
The CAS Registry Mumber 53358-54-6 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,3,3,5 and 8 respectively; the second part has 2 digits, 5 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 53358-54:
(7*5)+(6*3)+(5*3)+(4*5)+(3*8)+(2*5)+(1*4)=126
126 % 10 = 6
So 53358-54-6 is a valid CAS Registry Number.
53358-54-6Relevant articles and documents
Unexpected Rearrangement of 2-Bromoaniline under Biphasic Alkylation Conditions
Barraza, Scott J.,Denmark, Scott E.
supporting information, p. 2891 - 2895 (2017/10/06)
Alkylation of 2-bromoaniline with benzyl bromide under ostensibly basic N-alkylation conditions resulted in migration of bromine from the 2- to the 4-aryl position. Herein we report our studies to elucidate the mechanism of this rearrangement with the objective of suppressing this unexpected outcome. We find that careful choice of reagents is critical, and that this behavior may be extrapolated to alkylation reactions of electron-rich bromo- and iodoanilines in general.
Aerobic photooxidative bromination of aromatic compounds using carbon tetrabromide mediated by anthraquinone-2-carboxylic acid
Tanaka, Masanori,Kamito, Yuji,Lei, Cui,Tada, Norihiro,Itoh, Akichika
, p. 5886 - 5888 (2015/11/02)
We developed the aerobic photooxidative bromination of aromatic compounds using carbon tetrabromide in the presence of anthraquinone-2-carboxylic acid under visible light irradiation.
NEAR-INFRARED ABSORBING FILM COMPOSITIONS
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Page/Page column 31, (2011/04/13)
A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine -based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near- infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
