22041-18-5Relevant articles and documents
COMPOUNDS USEFUL IN HIV THERAPY
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Page/Page column 43, (2019/05/22)
The invention relates to compounds of Formulas (I), (II) and (III) salts thereof, pharmaceutical compositions thereof, as well as methods of treating, curing or preventing HIV in subjects.
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
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, (2010/04/23)
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
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, (2008/06/13)
Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.