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22041-18-5

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22041-18-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 22041-18-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,2,0,4 and 1 respectively; the second part has 2 digits, 1 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 22041-18:
(7*2)+(6*2)+(5*0)+(4*4)+(3*1)+(2*1)+(1*8)=55
55 % 10 = 5
So 22041-18-5 is a valid CAS Registry Number.
InChI:InChI=1/C7H13NO2/c1-10-7(9)6-8-4-2-3-5-8/h2-6H2,1H3

22041-18-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name methyl 2-pyrrolidin-1-ylacetate

1.2 Other means of identification

Product number -
Other names ACETIC ACID,PYRROLIDIN-1-YL-,METHYL ESTER

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:22041-18-5 SDS

22041-18-5Relevant articles and documents

COMPOUNDS USEFUL IN HIV THERAPY

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Page/Page column 43, (2019/05/22)

The invention relates to compounds of Formulas (I), (II) and (III) salts thereof, pharmaceutical compositions thereof, as well as methods of treating, curing or preventing HIV in subjects.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

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, (2010/04/23)

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

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, (2008/06/13)

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

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